公开(公告)号：SG152898A1

公开(公告)日：2009-06-29

申请号：SG2003056066

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JEUNINK ANDRE BERNARDUS ,  MEGENS HENRY ,  KOREN NAVARRO Y ,  TOLSMA HOITE PIETER THEODOOR ,  SIMONS HUBERTUS JOHANNES GERTRUDUS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  BOK LEE YOUNG ,  DUNBAR ALLAN REUBEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26 ,  G03F7/207

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.