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公开(公告)号：JP2012094915A
公开(公告)日：2012-05-17
申请号：JP2012022300
申请日：2012-02-03
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRANCISCUS , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SIMONS , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC: G01B11/00 , H01L21/027 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC classification number: G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.
Abstract translation: 要解决的问题：提供一种提高定位精度和/或鲁棒特性的光刻投影装置的对准系统。 解决方案：用于光刻设备的对准系统包括：定位辐射源1; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的定位标记的位置。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2004282017A
公开(公告)日：2004-10-07
申请号：JP2003366657
申请日：2003-09-19
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC: G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC classification number: G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
Abstract: PROBLEM TO BE SOLVED: To provide a positioning system for a lithographic projector in which accuracy of alignment and/or hardness is improved. SOLUTION: The positioning system for a lithographic apparatus has a positioning radiation source 1, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination, to determine a position of a positioning mark on a first object relative to a reference position on a second object based on the combined information. COPYRIGHT: (C)2005,JPO&NCIPI
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公开(公告)号：JP2009069163A
公开(公告)日：2009-04-02
申请号：JP2008307147
申请日：2008-12-02
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC: G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC classification number: G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting device, with the accuracy of positioning and/or robust properties improved. SOLUTION: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit that communicates with the detection system. The position-determining unit processes information from the first and second detector channels in combination and determines the position of an alignment mark on a first object relative to a reference position on a second object, based on the combined information. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供用于光刻投影装置的对准系统，其具有改善的定位精度和/或鲁棒特性。 解决方案：用于光刻设备的对准系统具有对准辐射源，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统通信的位置确定单元。 位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的对准标记的位置。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008034878A
公开(公告)日：2008-02-14
申请号：JP2007267899
申请日：2007-10-15
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC: G01B11/00 , H01L21/027 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC classification number: G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for lithographic projection equipment in which the accuracy and/or robust property of alignment are improved. SOLUTION: The alignment system of the lithographic equipment includes an aligning radiation source 1, a detection system having a first detector channel and a second detector channel, and an alignment unit communicated with the detection system. The alignment unit determines the position of an alignment mark on a first object for a reference position on a second object based on a combined information that is combined and processed the information from the first and second detection channels. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种用于光刻投影设备的对准系统，其中对准的精度和/或鲁棒性能得到改善。 解决方案：光刻设备的对准系统包括对准辐射源1，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统连通的对准单元。 对准单元基于组合和处理来自第一和第二检测通道的信息的组合信息，确定第一对象上的对准标记在第二对象上的参考位置的位置。 版权所有（C）2008，JPO＆INPIT
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5.发明专利Lithographic apparatus, method of determining model parameter, method of manufacturing device, and device manufactured thereby 有权光刻设备，确定模型参数的方法，制造装置的方法和制造的装置
公开(公告)号：JP2005175487A
公开(公告)日：2005-06-30
申请号：JP2004355504
申请日：2004-12-08
Applicant: Asml Netherlands Bv , Interuniv Micro Elektro Centrum Vzb , アイエムイーシー(インターユニバーシティ マイクロエレクトロニクス センター)ブイゼットダブリュ , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： VAN DER SCHAAR MAURITS , HUIJBREGTSE JEROEN , SCHETS SICCO IAN , SWINNEN BART L
CPC classification number: G03F9/7092
Abstract: PROBLEM TO BE SOLVED: To provide a method of determining a position of an object and a lithographic projection apparatus. SOLUTION: A method according to an embodiment of the present invention relates to determining at least one parameter of a model providing information on a position of an object. The object has a plurality of alignment marks clarifying a determined position. The method includes determining a plurality of positional parameters of each alignment mark. The positional parameters are weighted by a weighting factor and measured, and based on the plurality of positional parameters thus obtained, at least one parameter of the model of the object is determined. A numeric value of each weighting factor is determined with at least one parameter of the model. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种确定物体和光刻投影装置的位置的方法。 解决方案：根据本发明的实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 该对象具有多个对准标记，其清楚确定的位置。 该方法包括确定每个对准标记的多个位置参数。 位置参数由加权因子加权并被测量，并且基于如此获得的多个位置参数，确定对象的模型的至少一个参数。 使用模型的至少一个参数来确定每个加权因子的数值。 版权所有（C）2005，JPO＆NCIPI
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Patent Agency Ranking
公开(公告)号：NL2010626A
公开(公告)日：2013-06-24
申请号：NL2010626
申请日：2013-04-11
Applicant: ASML NETHERLANDS BV
Inventor： HENDRIKS JIMI , BRUEBACH JOERG , HUIJBREGTSE JEROEN , BOOGAARD ARJEN , KEMPEN ANTONIUS , SINGH HARMEET , HUIJSER SASKIA
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公开(公告)号：DE102012202850A1
公开(公告)日：2013-08-29
申请号：DE102012202850
申请日：2012-02-24
Applicant: ASML NETHERLANDS BV , ZEISS CARL SMT GMBH
Inventor： EHM DIRK HEINRICH , STORM ARNOLDUS JAN , GRABER TINA , HUIJBREGTSE JEROEN , TE SLIGTE EDWIN , THEODORUS HERMANUS HENDRICUS PETRUS
Abstract: Die Erfindung betrifft ein Verfahren zum Optimieren eines Schutzlagensystems (59) für ein EUV-Strahlung (6) reflektierendes Mehrlagensystem (51) eines optischen Elements (50), umfassend die Schritte: Auswählen eines Materials für eine oberste Lage (57) des Schutzlagensystems (59) aus einer Gruppe von chemischen Verbindungen umfassend: Oxide, Karbide, Nitride, Silikate und Boride, wobei das Auswählen des Materials für die oberste Lage (57) in Abhängigkeit von einer Bildungsenthalpie der jeweiligen chemischen Verbindung erfolgt. Die Erfindung betrifft auch ein optisches Element (50), umfassend: ein EUV-Strahlung (6) reflektierendes Mehrlagensystem (51), sowie ein Schutzlagensystem (59) mit einer obersten Lage (57) aus einem Material, welches ausgewählt ist aus einer Gruppe von chemischen Verbindungen umfassend: Oxide, Karbide, Nitride, Silikate und Boride, wobei das Schutzlagensystem (59) entweder aus der obersten Lage (57) mit einer Dicke (d) zwischen 5 nm und 15 nm besteht oder das Schutzlagensystem (59) mindestens eine weitere Lage (58) unter der obersten Lage (57) aufweist, deren Dicke (d2) größer ist als die Dicke (d1) der obersten Lage (57).
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公开(公告)号：DE102009043824A1
公开(公告)日：2011-02-24
申请号：DE102009043824
申请日：2009-08-21
Applicant: ASML NETHERLANDS BV , ZEISS CARL SMT GMBH
Inventor： KAMPEN MAARTEN VAN , EHM DIRK HEINRICH , VERBERK ROGIER , HUIJBREGTSE JEROEN
Abstract: Um den negativen Einfluss von metallischer Kontamination innerhalb einer EUV-Lithographievorrichtung auf die Reflektivität zu verringern, wird ein reflektives optisches Element (50) für den extremen ultravioletten und weichen Röntgenwellenlängenbereich mit einer reflektiven Fläche (59) mit oberster Lage (56) vorgeschlagen, bei dem die oberste Lage (56) eine oder mehrere organische Silizium-Verbindungen mit Kohlenstoff-Silizium- und/oder Silizium-Sauerstoff-Bindung aufweist.
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公开(公告)号：SG152898A1
公开(公告)日：2009-06-29
申请号：SG2003056066
申请日：2003-09-19
Applicant: ASML NETHERLANDS BV
Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRANCISCUS , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JEUNINK ANDRE BERNARDUS , MEGENS HENRY , KOREN NAVARRO Y , TOLSMA HOITE PIETER THEODOOR , SIMONS HUBERTUS JOHANNES GERTRUDUS , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , BOK LEE YOUNG , DUNBAR ALLAN REUBEN
IPC: G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01D5/26 , G03F7/207
Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.
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公开(公告)号：SG125923A1
公开(公告)日：2006-10-30
申请号：SG200305609
申请日：2003-09-19
Applicant: ASML NETHERLANDS BV
Inventor： HAREN VAN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , LALBAHADOERSING SANJAY , MOS EVERHARDUS CORNELIS , MEGENS HENRY , SCHAAR VAN DER MAURITS , HUIJBREGTSE JEROEN
IPC: G01B11/00 , G01B11/02 , G01B21/00 , G01D5/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
Abstract: Marker structure on a substrate for optical alignment of said substrate, said marker structure comprising a plurality of first structural elements and a plurality of second structural elements, in use said marker structure allowing said optical alignment based upon providing at least one light beam directed on said marker structure, - detecting light received from said marker structure at a sensor, - determining alignment information from said detected light, said alignment information comprising information relating a position of said substrate to said sensor.
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