公开(公告)号：JP2012094915A

公开(公告)日：2012-05-17

申请号：JP2012022300

申请日：2012-02-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JUENINK ANDRE BERNARDUS ,  MEGENS HENRY ,  NAVARRO Y KOREN RAMON ,  TOLSMA HOITE PIETER THEODOOR ,  HUBERTUS JOHANNES GERTRUDUS SIMONS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  LEE BRIAN ,  DUNBAR ALLAN

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.

Abstract translation: 要解决的问题：提供一种提高定位精度和/或鲁棒特性的光刻投影装置的对准系统。 解决方案：用于光刻设备的对准系统包括：定位辐射源1; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的定位标记的位置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：SG152898A1

公开(公告)日：2009-06-29

申请号：SG2003056066

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JEUNINK ANDRE BERNARDUS ,  MEGENS HENRY ,  KOREN NAVARRO Y ,  TOLSMA HOITE PIETER THEODOOR ,  SIMONS HUBERTUS JOHANNES GERTRUDUS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  BOK LEE YOUNG ,  DUNBAR ALLAN REUBEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26 ,  G03F7/207

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

公开(公告)号：SG158187A1

公开(公告)日：2010-01-29

申请号：SG2009086802

申请日：2005-12-23

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA

Abstract: Lithographic Apparatus using multiple Alignment Arrangements and Alignment Measurement Method A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: ò detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; ò detecting said same first mark and producing a second alignment signal by a second detector using a different way of alignment measurement than said first detector; ò receiving said first alignment signal from said first detector; ò calculating a first position of said at least first mark based on said first alignment signal; ò receiving said second alignment signal from said second detector; ò calculating a further first position of said at least first mark based on said second alignment signal. [Fig. 14]