公开(公告)号：JP2011228742A

公开(公告)日：2011-11-10

申请号：JP2011162445

申请日：2011-07-25

Applicant: Asml Netherlands Bv ,  Koninklijke Philips Electronics Nv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ

Inventor： WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  BANINE VADIM YEVGENYEVICH ,  JOHANNES CHRISTIAAN LEONARDUS FRANKEN ,  OLAV WALDEMAR VLADIMIR FRIJNS ,  DERK JAN WILFRED KLUNDER ,  NIELS MACHIEL DRIESSEN ,  SOER WOUTER ANTHON

IPC: H01L21/027 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G01N21/15 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide an optical sensor device capable of monitoring the extent of contamination accumulated in an EUV system.SOLUTION: An optical sensor device for use in an extreme ultraviolet ray lithography system comprises an optical sensor including a sensor surface and a removing mechanism for removing debris from the sensor surface. Therefore, measurement of the dose and/or contamination can be accomplished favorably for the lithography system.

Abstract translation: 要解决的问题：提供能够监测在EUV系统中累积的污染程度的光学传感器装置。 解决方案：用于极紫外线光刻系统的光学传感器装置包括光学传感器，其包括传感器表面和用于从传感器表面去除碎屑的去除机构。 因此，对于光刻系统，可以有利地实现剂量和/或污染物的测量。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012109613A

公开(公告)日：2012-06-07

申请号：JP2012037310

申请日：2012-02-23

Applicant: ASML NETHERLANDS BV

Inventor： WASSINK ARNOLD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN ,  CADEE THEODORUS PETRUS MARIA ,  CLIVITZN VLADIMIR MIKHAILOVICH ,  DERK JAN WILFRED KLUNDER ,  WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  PAUL PETER ANNA ANTONIUS BROM ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS ALEXANDROVICH

IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.