公开(公告)号：JP2011258990A

公开(公告)日：2011-12-22

申请号：JP2011204659

申请日：2011-09-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VLADIMIR VITALEVICH IVANOV ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN

IPC: H01L21/027 ,  H05G2/00

CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To reduce fast ions in a plasma radiation source.SOLUTION: The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near discharge space to create a main plasma channel which triggers discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcut of a main plasma current is realized, which can reduce an amount of fast ions to be produced.

Abstract translation: 要解决的问题：减少等离子体辐射源中的快速离子。 解决方案：辐射源包括第一激活源，以将第一能量脉冲引导到放电空间附近的辐射源中的第一点上，以产生触发放电的主等离子体通道。 辐射源还具有第二激活源，以将第二能量脉冲引导到放电空间附近的辐射源中的第二点上，以产生附加的等离子体通道。 通过在相同放电期间引导第二能量脉冲，实现了主等离子体电流的捷径，这可以减少要产生的快离子的量。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012109613A

公开(公告)日：2012-06-07

申请号：JP2012037310

申请日：2012-02-23

Applicant: ASML NETHERLANDS BV

Inventor： WASSINK ARNOLD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN ,  CADEE THEODORUS PETRUS MARIA ,  CLIVITZN VLADIMIR MIKHAILOVICH ,  DERK JAN WILFRED KLUNDER ,  WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  PAUL PETER ANNA ANTONIUS BROM ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS ALEXANDROVICH

IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

公开(公告)号：NL2002890A1

公开(公告)日：2009-12-17

申请号：NL2002890

申请日：2009-05-14

Applicant: ASML NETHERLANDS BV

Inventor： GLUSHKOV DENNIS ,  BANINE VADIM ,  IVANOV VLADIMIR ,  KOSHELEV KONSTANTIN ,  KRIVTSUN VLADIMIR ,  ZUKAKISHVILI GIVI ,  SIDELNIKOV YURII ,  YAKUSHEV OLEG

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005750A

公开(公告)日：2011-01-18

申请号：NL2005750

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  KOSHELEV KONSTANTIN ,  KRIVTSUN VLADIMIR ,  GLUSHKOV DENIS

IPC: G03F7/20 ,  H05G2/00