公开(公告)号：JP2011014899A

公开(公告)日：2011-01-20

申请号：JP2010141165

申请日：2010-06-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JAK MARTIN JACOBUS JOHAN ,  BANINE VADIM YEVGENYEVICH ,  WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS ALEXANDROVICH ,  YAKUNIN ANDREY MIKHAILOVICH

IPC: H01L21/027 ,  G02B5/20 ,  G21K3/00

CPC classification number: G03B27/72 ,  G02B5/204 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To provide an EUV spectral purity filter which is efficient and easy to manufacture without causing any defect associated with silicidation of a reflective coating in a hydrogen radical atmosphere.SOLUTION: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride SiN, or silicon dioxide SiOis provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures.

Abstract translation: 要解决的问题：提供一种有效且易于制造的EUV光谱纯度过滤器，而不会引起与氢气氛中的反射涂层的硅化相关的任何缺陷。解决方案：透射光谱纯度过滤器被配置为透射极紫外辐射 。 光谱纯度滤光器包括具有多个孔以便透射极紫外辐射并抑制第二类辐射的透射的滤光器部分。 孔可以通过各向异性蚀刻工艺在诸如硅的载体材料中制成，并且覆盖有诸如Mo金属，Ru金属，TiN或RuO的反射层。 在金属和半导体之间设置有诸如氮化硅SiN或二氧化硅SiO 2的扩散阻挡层，以防止金属在升高的温度下扩散和硅化。

公开(公告)号：JP2012109613A

公开(公告)日：2012-06-07

申请号：JP2012037310

申请日：2012-02-23

Applicant: ASML NETHERLANDS BV

Inventor： WASSINK ARNOLD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN ,  CADEE THEODORUS PETRUS MARIA ,  CLIVITZN VLADIMIR MIKHAILOVICH ,  DERK JAN WILFRED KLUNDER ,  WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  PAUL PETER ANNA ANTONIUS BROM ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS ALEXANDROVICH

IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.