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公开(公告)号:JP2012028813A
公开(公告)日:2012-02-09
申请号:JP2011231451
申请日:2011-10-21
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor: JOHANNES CHRISTIAAN LEONARDUS FRANKEN , BANINE VADIM YEVGENYEVICH , WASSINK ARNOLD CORNELIS
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70916 , B82Y10/00 , F16C32/0603 , F16C32/0685 , F16C33/02 , F16C33/72 , F16C2300/62 , G03F7/70033 , G03F7/70941
Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method comprising an improved debris mitigation system.SOLUTION: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are substantially in parallel with the direction of propagation of the radiation beam, the rotor including electrically chargeable material and being electrically charged as a result of the operation of the radiation source; and a bearing rotatably holding the rotor with respect to a rotor carrying structure. The apparatus is configured to (i) control or redirect electrical discharge of the rotor, or (ii) suppress electrical discharge of the rotor, or (iii) both (i) and (ii).
Abstract translation: 要解决的问题:提供一种包括改进的碎片减轻系统的装置和方法。 公开了一种布置在辐射束的路径中的污染捕集装置,用于捕获从被配置成产生辐射束的辐射源发出的污染物。 污染物捕集装置包括具有多个通道形成元件的转子,该多个通道形成元件限定与辐射束的传播方向基本上平行的通道,转子包括可充电的材料并且由于辐射的操作而带电 资源; 以及相对于转子承载结构可旋转地保持转子的轴承。 该装置被配置为(i)控制或改变转子的放电,或(ii)抑制转子的放电,或(iii)(i)和(ii)两者。 版权所有(C)2012,JPO&INPIT
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公开(公告)号:JP2012109613A
公开(公告)日:2012-06-07
申请号:JP2012037310
申请日:2012-02-23
Applicant: ASML NETHERLANDS BV
Inventor: WASSINK ARNOLD CORNELIS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVICH , KOSHELEV KONSTANTIN , CADEE THEODORUS PETRUS MARIA , CLIVITZN VLADIMIR MIKHAILOVICH , DERK JAN WILFRED KLUNDER , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , PAUL PETER ANNA ANTONIUS BROM , SOER WOUTER ANTHON , GLUSHKOV DENIS ALEXANDROVICH
IPC: H01L21/027 , G03F7/20 , H05G2/00
Abstract: PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
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