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公开(公告)号：NL2004540A
公开(公告)日：2010-11-18
申请号：NL2004540
申请日：2010-04-13
Applicant: ASML NETHERLANDS BV
Inventor： JANSEN BAUKE , BRULS RICHARD , JANSEN HANS , NET ANTONIUS , KRAMER PIETER , KUIJPER ANTHONIE , MARTENS ARJAN , CASIMIRI ERIC
IPC: G03F7/20
Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
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