公开(公告)号：NL2009591A

公开(公告)日：2013-05-23

申请号：NL2009591

申请日：2012-10-09

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  NET ANTONIUS ,  HEUVEL LEONARDA ,  BOXTEL FRANK

IPC: G03F7/20

公开(公告)号：NL2006243A

公开(公告)日：2011-09-20

申请号：NL2006243

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： NET ANTONIUS ,  BOXTEL FRANK ,  PAARHUIS BART ,  LI JINGGAO ,  GOSEN JEROEN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2009378A

公开(公告)日：2013-04-09

申请号：NL2009378

申请日：2012-08-29

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  NET ANTONIUS ,  HEUVEL LEONARDA

IPC: G03F7/20

公开(公告)号：NL2008186A

公开(公告)日：2012-09-17

申请号：NL2008186

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  GRAAF ROELOF ,  NET ANTONIUS ,  UIJTREGT JOHANNES ,  HEUVEL LEONARDA

IPC: G03F7/20

公开(公告)号：NL2004820A

公开(公告)日：2011-01-04

申请号：NL2004820

申请日：2010-06-04

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  NET ANTONIUS ,  EUMMELEN ERIK ,  KUIJPER ANTHONIE

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.