公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2009284A

公开(公告)日：2013-10-31

申请号：NL2009284

申请日：2012-08-06

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  GRAAF ROELOF ,  ROSET NIEK ,  MARTENS ARJAN ,  ZDRAVKOV ALEXANDER ,  HOEKERD KORNELIS ,  DZIOMKINA NINA

IPC: G03F7/20

公开(公告)号：NL2008954A

公开(公告)日：2013-01-09

申请号：NL2008954

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  GOSEN JEROEN ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  DAMME JEAN-PHILIPPE ,  SCHOENMAKERS PETER ,  EVERS FRANCISCUS ,  EMPEL JAAP ,  COUMANS LEON ,  GERRITZEN JUSTIN

IPC: G03F7/20

公开(公告)号：NL2004162A

公开(公告)日：2010-08-18

申请号：NL2004162

申请日：2010-01-28

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN

IPC: G03F7/20

Abstract: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.

公开(公告)号：NL2003341A

公开(公告)日：2010-03-10

申请号：NL2003341

申请日：2009-08-11

Applicant: ASML NETHERLANDS BV

Inventor： MARTENS ARJAN ,  VERHAGEN MARTINUS ,  KRAMER PIETER ,  HEUSSCHEN HUBERTUS

IPC: G03F7/20

公开(公告)号：NL2005009A

公开(公告)日：2011-01-31

申请号：NL2005009

申请日：2010-07-01

Applicant: ASML NETHERLANDS BV

Inventor： MARTENS ARJAN ,  KRAMER PIETER

IPC: G03F7/20

Abstract: Fluid temperature control and sensor calibration is disclosed. In an embodiment, a fluid temperature control unit includes a heater configured to heat a first fluid in a first fluid path, a first temperature sensor configured to measure a temperature of the first fluid in the first fluid path, a second temperature sensor configured to measure a temperature of a second fluid in a second fluid path, and a controller configured to control the heater on the basis of the temperature sensed by the first sensor and the temperature sensed by the second sensor.

公开(公告)号：NL2009899A

公开(公告)日：2013-06-24

申请号：NL2009899

申请日：2012-11-28

Applicant: ASML NETHERLANDS BV

Inventor： GAAG MARC ,  HEUVEL LEONARDA ,  MARTENS ARJAN ,  BOXTEL FRANK

IPC: G03F7/20

Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.