公开(公告)号：JP2011142348A

公开(公告)日：2011-07-21

申请号：JP2011089751

申请日：2011-04-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIJPER ANTHONIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion liquid containing one or more additives which further prevent the problem of a stain. SOLUTION: The immersion liquid contains an ion forming component containing acid or base having, for example, comparatively high vapor pressure. Lithographing method and system using this immersion liquid is also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供含有一种或多种进一步防止污点问题的添加剂的浸液。 解决方案：浸渍液含有含有例如具有较高蒸气压的酸或碱的离子形成组分。 还提供了使用该浸液的石版印刷方法和系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010192896A

公开(公告)日：2010-09-02

申请号：JP2010027091

申请日：2010-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce or dissolve temperature changes of liquid immersion solution being supplied to a lithographic apparatus. SOLUTION: A fluid supply system for a lithographic apparatus includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：减少或解决供应给光刻设备的液浸溶液的温度变化。 解决方案：用于光刻设备的流体供应系统包括控制器，该控制器被配置为将来自流体源的流体流速改变为第一部件，同时保持对流体源下游的流体基本上恒定的总流动阻力。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011029599A

公开(公告)日：2011-02-10

申请号：JP2010107057

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  CASIMIRI ERIC WILLEM FELIX

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a system which reduces pollution in an immersion lithographic apparatus, and reduces an interruption time for cleaning the immersion lithographic apparatus if not eliminated.
SOLUTION: A cleaner (for instance, an active cleaning agent) is added to immersion liquid in order to clean and/or prevent accumulation of pollution during exposure of a substrate to clean the immersion lithographic apparatus. For the cleaner, a surface-active agent, a cleaning agent, soap, an acid, an alkali, a solvent (nonpolar organic solvent, polar organic solvent or the like), another optional cleaning agent appropriate for a lithographic apparatus or the like is used. The cleaning agent may be present at a concentration

Abstract translation: 要解决的问题：提供一种减少浸没式光刻设备中的污染的系统，并且如果不消除浸没式光刻设备的清洁，减少清洗中断时间。

解决方案：为了清洁和/或防止在曝光基材以清洁浸没式光刻设备时的污染积聚，将清洁剂（例如，活性清洁剂）加入到浸液中。 对于清洁剂，表面活性剂，清洁剂，皂，酸，碱，溶剂（非极性有机溶剂，极性有机溶剂等），适用于光刻设备的其它任选的清洁剂等是 用过的。 清洁剂可以以<300ppb的浓度存在。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014902A

公开(公告)日：2011-01-20

申请号：JP2010142164

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRAMER PIETER JACOB ,  VAN DER NET ANTONIUS JOHANNUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  KUIJPER ANTHONIE

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/7085 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a system for detecting a flow in a two-phase flow; and to provide a system for detecting a ratio of gas to liquid in a two-phase flow.SOLUTION: The lithographic device including a duct for running a two-phase flow therein is disclosed. A flow divider for dividing a two-phase flow into a gas flow and a liquid flow is provided. A flowmeter measures a flow rate of a fluid in a gas flow or liquid flow.

Abstract translation: 要解决的问题：提供一种用于检测两相流中的流量的系统; 并提供一种用于检测两相流中气体与液体的比率的系统。解决方案：公开了包括用于在其中运行两相流的管道的光刻设备。 提供了用于将两相流分成气流和液流的分流器。 流量计测量气流或液体流中的流体的流量。

公开(公告)号：JP2010050454A

公开(公告)日：2010-03-04

申请号：JP2009186941

申请日：2009-08-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus by which two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized. SOLUTION: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以将两相流稳定化和/或至少基本上分离成液态和气体流并且期望地基本上最小化的装置。 解决方案：描述了一种浸没式光刻设备，其中通过使富含液体的液流优先沿着表面流动，将两相流分离成富含液体的富气流。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011082511A

公开(公告)日：2011-04-21

申请号：JP2010212952

申请日：2010-09-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOEKERD KORNELIS TIJMEN ,  DE GRAAF ROELOF FREDERIK ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  VAN DER GRAAF SANDRA ,  PADIY ALEXANDRE VIKTOROVYCH

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03F7/70925 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：将要在所需工作区域中的基础液体和乳化成分的比率的清洗液供给到要清洁的浸渍系统。 解决方案：清洁液体供给装置构造成将乳化的清洁流体供应到浸没式光刻设备。 该装置包括混合器，其被配置为将来自添加剂流体供应部分的添加剂流体和来自浸没供应部分的浸没液体混合以制备乳化清洁流体;被配置为感测乳化清洁流体的物理特性的传感器系统，以及 连接到传感器和混合器的控制器。 控制器控制添加剂流体从添加剂流体供应部分到混合器的供应以及乳化清洁流体的物理特性。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007053377A

公开(公告)日：2007-03-01

申请号：JP2006221569

申请日：2006-08-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  SENGERS TIMOTHEUS FRANCISCUS ,  KUIJPER ANTHONIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To adjust a conventional lithography equipment to an environment of immersion. SOLUTION: In the lithography projection equipment, a liquid supply system and an object W on a substrate table WT are arranged to prevent a high-speed immersion liquid from flowing onto a sensor S. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：将常规光刻设备调整到浸没环境。 解决方案：在光刻投影设备中，布置液体供应系统和衬底台WT上的物体W，以防止高速浸没液体流入传感器S.版权所有（C）2007 ，JPO＆INPIT

公开(公告)号：WO2006084641A2

公开(公告)日：2006-08-17

申请号：PCT/EP2006001005

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：NL2008954A

公开(公告)日：2013-01-09

申请号：NL2008954

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  GOSEN JEROEN ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  DAMME JEAN-PHILIPPE ,  SCHOENMAKERS PETER ,  EVERS FRANCISCUS ,  EMPEL JAAP ,  COUMANS LEON ,  GERRITZEN JUSTIN

IPC: G03F7/20

公开(公告)号：NL2007182A

公开(公告)日：2012-02-27

申请号：NL2007182

申请日：2011-07-26

Applicant: ASML NETHERLANDS BV

Inventor： WILLEMS PAUL ,  KATE NICOLAAS ,  KOELINK STEPHAN ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  ZDRAVKOV ALEXANDER ,  CORTIE ROGIER

IPC: G03F7/20