公开(公告)号：NL2007182A

公开(公告)日：2012-02-27

申请号：NL2007182

申请日：2011-07-26

Applicant: ASML NETHERLANDS BV

Inventor： WILLEMS PAUL ,  KATE NICOLAAS ,  KOELINK STEPHAN ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  ZDRAVKOV ALEXANDER ,  CORTIE ROGIER

IPC: G03F7/20

公开(公告)号：NL2004162A

公开(公告)日：2010-08-18

申请号：NL2004162

申请日：2010-01-28

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN

IPC: G03F7/20

Abstract: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.

公开(公告)号：NL2003341A

公开(公告)日：2010-03-10

申请号：NL2003341

申请日：2009-08-11

Applicant: ASML NETHERLANDS BV

Inventor： MARTENS ARJAN ,  VERHAGEN MARTINUS ,  KRAMER PIETER ,  HEUSSCHEN HUBERTUS

IPC: G03F7/20

公开(公告)号：NL2005009A

公开(公告)日：2011-01-31

申请号：NL2005009

申请日：2010-07-01

Applicant: ASML NETHERLANDS BV

Inventor： MARTENS ARJAN ,  KRAMER PIETER

IPC: G03F7/20

Abstract: Fluid temperature control and sensor calibration is disclosed. In an embodiment, a fluid temperature control unit includes a heater configured to heat a first fluid in a first fluid path, a first temperature sensor configured to measure a temperature of the first fluid in the first fluid path, a second temperature sensor configured to measure a temperature of a second fluid in a second fluid path, and a controller configured to control the heater on the basis of the temperature sensed by the first sensor and the temperature sensed by the second sensor.

公开(公告)号：NL2006648A

公开(公告)日：2011-12-06

申请号：NL2006648

申请日：2011-04-20

Applicant: ASML NETHERLANDS BV

Inventor： BOKHOVEN LAURENTIUS ,  KATE NICOLAAS ,  KRAMER PIETER

IPC: G03F7/20

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2004820A

公开(公告)日：2011-01-04

申请号：NL2004820

申请日：2010-06-04

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  NET ANTONIUS ,  EUMMELEN ERIK ,  KUIJPER ANTHONIE

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.