公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.