公开(公告)号：JP2014132694A

公开(公告)日：2014-07-17

申请号：JP2014076940

申请日：2014-04-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROGER SCHMITZ ,  VAN EMPEL TJARKO ,  MARCEL MUITJENS ,  CHENG LUN ,  FRANK JANSSEN ,  WILLIAM VAN HELDEN ,  RICHARD VERSLUIS ,  PAUL SCHAAREMAN ,  AXEL LEXMOND ,  EVERT NIEUWKOOP ,  BILL POTTS ,  MARTIN LEMMEN ,  RIK VAN DER GRAAF ,  MACHTELD DE KROON ,  HAN VELTHUIS

IPC: H01L21/027

CPC classification number: G03F7/70891 ,  G02B7/008 ,  G03F7/70875 ,  G03F7/709 ,  G03F7/70983 ,  G21K2201/067

Abstract: PROBLEM TO BE SOLVED: To provide an efficient method to thermally condition an optical element that can be subjected to high heat loads during its operation, without impairing accuracy of the operation of the element.SOLUTION: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not irradiating the optical element with the radiation, allowing a heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiation of the optical element is lower than a flow rate of the fluid when the optical element is not irradiated.

Abstract translation: 要解决的问题：提供一种有效的方法来热处理在其操作期间可承受高热负荷的光学元件，而不损害元件的操作精度。解决方案：一种用于热调节光学元件的方法包括照射 具有辐射的光学元件不用辐射照射光学元件，允许光学元件和保持在调节流体储存器中的调节流体之间的热流，并且提供调节流体的流体流，以供应热调节 流体到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。

公开(公告)号：NL2002907A1

公开(公告)日：2009-12-11

申请号：NL2002907

申请日：2009-05-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHMITZ ROGER ,  NIEUWKOOP EVERT ,  POTTS BILL ,  LEMMEN MARTIN ,  GRAAF RIK VAN DER ,  KROON MACHTELD DE ,  VELTHUIS HAN ,  EMPEL TJARKO VAN ,  MUITJENS MARCEL ,  CHENG LUN ,  JANSSEN FRANK ,  HELDEN WILLIAM VAN ,  VERSLUIS RICHARD ,  SCHAAREMAN PAUL ,  LEXMOND AXEL

IPC: G03F7/20