公开(公告)号：WO2008034582A2

公开(公告)日：2008-03-27

申请号：PCT/EP2007008113

申请日：2007-09-18

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV ,  EHM DIRK HEINRICH ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

Inventor： EHM DIRK HEINRICH ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

IPC: G03F7/20

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: The invention relates to an optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, comprising: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 用于EUV光刻的投影曝光装置技术领域本发明涉及一种用于EUV光刻的光学装置，尤其是投影曝光装置（1），包括：包围内部空间（15）的壳体（2）; （2）中布置的至少一个，特别是反射性光学元件（4至10,12,14.1至14.6）; 至少一个真空发生单元（3），用于在壳体（2）的内部空间（15）中产生真空; 和至少一个布置在壳体（2）的内部空间（15）中并至少包围光学元件（4）的光学表面（17,17.1,17.2）的真空壳体（18,18.1至18.10） 其中污染减少单元与真空壳体（18.1至18.10）相关联，所述污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于所述内部空间（15）中的污染物质的分压紧邻所述光学表面（17,17.1,17.2）。

公开(公告)号：WO2008063056A2

公开(公告)日：2008-05-29

申请号：PCT/NL2007050545

申请日：2007-11-08

Applicant: ASML NETHERLANDS BV ,  KOSTER NORBERTUS BENEDICTUS ,  VERSLUIS RICHARD ,  PAARHUIS BART DINAND

Inventor： KOSTER NORBERTUS BENEDICTUS ,  VERSLUIS RICHARD ,  PAARHUIS BART DINAND

IPC: G01N1/22 ,  G01N33/00 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G01N1/2273 ,  G03F7/7085

Abstract: A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.

Abstract translation: 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于截面面积的横截面积 通道部分。

公开(公告)号：NL2002907A1

公开(公告)日：2009-12-11

申请号：NL2002907

申请日：2009-05-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHMITZ ROGER ,  NIEUWKOOP EVERT ,  POTTS BILL ,  LEMMEN MARTIN ,  GRAAF RIK VAN DER ,  KROON MACHTELD DE ,  VELTHUIS HAN ,  EMPEL TJARKO VAN ,  MUITJENS MARCEL ,  CHENG LUN ,  JANSSEN FRANK ,  HELDEN WILLIAM VAN ,  VERSLUIS RICHARD ,  SCHAAREMAN PAUL ,  LEXMOND AXEL

IPC: G03F7/20

公开(公告)号：DE102006044591A1

公开(公告)日：2008-04-03

申请号：DE102006044591

申请日：2006-09-19

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： EHM DIRK ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

IPC: G03F7/20

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).