公开(公告)号：JP2008182270A

公开(公告)日：2008-08-07

申请号：JP2008107079

申请日：2008-04-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: H01L21/027 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method, capable of compensating for or improving the effect of a thick pellicle. SOLUTION: The thick pellicle is used to calculate corrections to be applied in exposure so that the thick pellicle is allowed to have a non-flat shape, and the shape compensates for the optical effect of the pellicle. In order for the pellicle to more readily compensate for, to be mounted, in such a manner as to employ a one-dimensional shape under the influence of gravity. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够补偿或改善厚薄膜的效果的光刻投影装置和装置制造方法。

解决方案：使用厚的防护薄膜来计算曝光中应用的校正值，使得薄膜组件具有非平坦的形状，并且该形状补偿防护薄膜的光学效果。 为了使防护薄膜组件更容易地在重力的影响下以使其成为一维形状的方式进行补偿。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343102A

公开(公告)日：2004-12-02

申请号：JP2004132528

申请日：2004-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method capable of compensating for or improving the effect of a thick pellicle.
SOLUTION: The thick pellicle is characterized for calculating a correction to be applied in exposure so that the hick pellicle is allowed to have a non-flat shape and the shape compensates for the optical effect of the pellicle. As the pellicle readily compensates for, it can be mounted in such a manner as to employ a one-dimensional shape under the influence of gravity.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG118242A1

公开(公告)日：2006-01-27

申请号：SG200402194

申请日：2004-04-22

Applicant: ASML NETHERLANDS BV

Inventor： WEHRENS MARTIJN GERARD DOMINIQUE ,  UITTERDIJK TAMMO ,  LUIJTEN CARLO CORNELIS MARIA ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  BRULS RICHARD JOSEPH ,  PONGERS WILLEM RICHARD ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  JANSEN ALBERT JOHANNES MARIA ,  DIJK VAN HENDRIKUS ALPHONSUS LUDOVICUS ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MARIA ,  DEMARTEAU MARCEL JOHANNES LOUIS MARIE

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027