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    Lithographic method and assembly
    1.
    发明专利
    Lithographic method and assembly 有权
    光刻方法和装配

    公开(公告)号：JP2012222350A

    公开(公告)日：2012-11-12

    申请号：JP2012079444

    申请日：2012-03-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ZHANG SHAOXIAN ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  JASPER JOHANNES CHRISTIAAN MARIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/706 ,  G03F7/70616 ,  G03F7/70625

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic method and/or an assembly where aberration sensitivity can be determined.SOLUTION: There is provided a lithographic method of determining sensitivity of a property of a pattern feature to changes in optical aberrations of a lithographic apparatus used for providing a pattern feature. The method includes the steps of: controlling a configuration of the lithographic apparatus so as to establish a first aberration state; forming a first image of the pattern feature with the lithographic apparatus when the lithographic apparatus is in the first aberration state; measuring a property of the image; controlling a configuration of the lithographic apparatus so as to establish a second different aberration state; forming an image of the same pattern feature with the lithographic apparatus when the lithographic apparatus is in the second aberration state; measuring the same property of the image; and determining the sensitivity of the property of the pattern feature to the changes in the aberration state using the measurement value.

    Abstract translation: 要解决的问题：提供可以确定像差灵敏度的光刻方法和/或组件。 解决方案：提供了一种确定图案特征的性质对用于提供图案特征的光刻设备的光学像差的变化的灵敏度的光刻方法。 该方法包括以下步骤：控制光刻设备的配置以建立第一像差状态; 当光刻设备处于第一像差状态时，用光刻设备形成图案特征的第一图像; 测量图像的属性; 控制光刻设备的配置以便建立第二不同的像差状态; 当光刻设备处于第二像差状态时，与光刻设备形成相同图案特征的图像; 测量图像的相同属性; 以及使用所述测量值来确定所述图案特征的特性对所述像差状态的变化的灵敏度。 版权所有（C）2013，JPO＆INPIT

    Lithographic method and apparatus
    4.
    发明专利
    Lithographic method and apparatus 有权
    光刻方法和装置

    公开(公告)号：JP2013187539A

    公开(公告)日：2013-09-19

    申请号：JP2013025770

    申请日：2013-02-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  JASPER JOHANNES CHRISTIAAN MARIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/705 ,  G03F7/70058 ,  G03F7/70141 ,  G03F7/706 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To provide, for example, a lithographic method which provides an improved throughput or availability compared with known lithographic methods.SOLUTION: Provided is a method of patterning substrates using a lithographic apparatus. The method comprises: providing a beam of radiation using an illumination system; using a patterning device to provide the radiation beam with a pattern in its cross-section; and using a projection system to project the patterned radiation beam onto target portions of a substrate lot. The method further comprises: performing radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the substrate lot; adjusting the projection system using results of the radiation beam aberration measurement; and then projecting the patterned radiation beam onto a further subset of the substrate lot.

    Abstract translation: 要解决的问题：提供例如与已知平版印刷方法相比提供改善的生产量或可用性的光刻方法。提供了一种使用光刻设备对基板进行图案化的方法。 该方法包括：使用照明系统提供辐射束; 使用图案形成装置在其横截面上提供具有图案的辐射束; 以及使用投影系统将图案化的辐射束投影到衬底批的目标部分上。 该方法还包括：在将图案化的辐射束投影到衬底批次的子集之后执行辐射束像差测量; 使用辐射束像差测量结果调整投影系统; 然后将图案化的辐射束投影到衬底批的另一个子集上。

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