公开(公告)号：JP2008182270A

公开(公告)日：2008-08-07

申请号：JP2008107079

申请日：2008-04-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: H01L21/027 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method, capable of compensating for or improving the effect of a thick pellicle. SOLUTION: The thick pellicle is used to calculate corrections to be applied in exposure so that the thick pellicle is allowed to have a non-flat shape, and the shape compensates for the optical effect of the pellicle. In order for the pellicle to more readily compensate for, to be mounted, in such a manner as to employ a one-dimensional shape under the influence of gravity. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够补偿或改善厚薄膜的效果的光刻投影装置和装置制造方法。

解决方案：使用厚的防护薄膜来计算曝光中应用的校正值，使得薄膜组件具有非平坦的形状，并且该形状补偿防护薄膜的光学效果。 为了使防护薄膜组件更容易地在重力的影响下以使其成为一维形状的方式进行补偿。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343102A

公开(公告)日：2004-12-02

申请号：JP2004132528

申请日：2004-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method capable of compensating for or improving the effect of a thick pellicle.
SOLUTION: The thick pellicle is characterized for calculating a correction to be applied in exposure so that the hick pellicle is allowed to have a non-flat shape and the shape compensates for the optical effect of the pellicle. As the pellicle readily compensates for, it can be mounted in such a manner as to employ a one-dimensional shape under the influence of gravity.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2011187930A

公开(公告)日：2011-09-22

申请号：JP2010278879

申请日：2010-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  FAHRNI FRANCIS ,  JOSEPH KEIJSERS GERARDUS J ,  MULDER HEINE MELLE ,  PONGERS WILLEM RICHARD ,  HAGEMAN JOOST CYRILLUS LAMBERT ,  VAN BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANCISCUS ,  BUTLER DAVID JAMES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA

IPC: H01L21/027

CPC classification number: G03B27/54

Abstract: PROBLEM TO BE SOLVED: To solve such a problem in a prior art that, after each scanning operation, the direction of mask scanning operation and the direction of substrate scanning operation are reversed and a substrate is moved even across the scanning direction, thus consuming a time. SOLUTION: A lithography apparatus includes an illumination system. The illumination system is arranged to provide a first radiation beam forming a first mask illumination zone and at the same time, and to provide a second radiation beam forming a second mask illumination zone. The first and second mask illumination zones are arranged to illuminate the same mask at the same time. The lithography apparatus also includes a light projection system. The projection system projects the first radiation beam so as to form a first substrate illumination zone and at the same time, and projects the second radiation beam so as to form a second substrate illumination zone. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决的问题为了解决现有技术中的这样一个问题，即在每次扫描操作之后，掩模扫描操作的方向和基板扫描操作的方向相反，并且基板在扫描方向上移动， 从而消耗时间。 解决方案：光刻设备包括照明系统。 照明系统被布置成提供形成第一掩模照明区域并同时提供形成第二掩模照射区域的第二辐射束的第一辐射束。 第一和第二掩模照明区域被布置成同时照射相同的掩模。 光刻设备还包括光投射系统。 投影系统投射第一辐射束，以形成第一衬底照明区，同时投射第二辐射束，以形成第二衬底照明区。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2004207738A

公开(公告)日：2004-07-22

申请号：JP2003425260

申请日：2003-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN ALBERT JOHANNES MARIA ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MAR ,  SCHRIJVER RAYMOND LAURENTIUS J ,  BRULS RICHARD JOSEPH ,  BASELMANS JOHANNES JACOBUS MAT ,  PONGERS WILLEM RICHARD ,  UITTERDIJK TAMMO

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70308 ,  G03F7/70716 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector which reduces the number of man-hours required to exchange a reticle with a pellicle, with a reticle without a pellicle. SOLUTION: In the present projection system, the pattern surface on the reticle is lightened so that a projected image that focuses on an image-forming surface can be obtained. If a pellicle exists in an optical path, a substantial shift occurs in the position of the pattern surface of the reticle. It is necessary to adapt the image-forming surface of the projected image for a proper focus depending on the presence or absence of the pellicle. A corrector moves the position of the pattern surface, thereby the substantial shift of the pattern surface due to the pellicle is removed. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：DK3851904T3

公开(公告)日：2023-02-27

申请号：DK20213776

申请日：2020-12-14

Applicant: ASML NETHERLANDS BV

Inventor： SABERT HENDRIK ,  UEBEL PATRICK SEBASTIAN ,  PONGERS WILLEM RICHARD

IPC: G02F1/01 ,  G02B6/02 ,  G02F1/383 ,  G03F7/00

公开(公告)号：SG118242A1

公开(公告)日：2006-01-27

申请号：SG200402194

申请日：2004-04-22

Applicant: ASML NETHERLANDS BV

Inventor： WEHRENS MARTIJN GERARD DOMINIQUE ,  UITTERDIJK TAMMO ,  LUIJTEN CARLO CORNELIS MARIA ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  BRULS RICHARD JOSEPH ,  PONGERS WILLEM RICHARD ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  JANSEN ALBERT JOHANNES MARIA ,  DIJK VAN HENDRIKUS ALPHONSUS LUDOVICUS ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MARIA ,  DEMARTEAU MARCEL JOHANNES LOUIS MARIE

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027

公开(公告)号：SG135935A1

公开(公告)日：2007-10-29

申请号：SG2003077260

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN ALBERT JOHANNES MARIA ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MAR ,  SCHRIJVER RAYMOND LAURENTIUS J ,  BRULS RICHARD JOSEPH ,  BASELMANS JOHANNES JACOBUS MAT ,  PONGERS WILLEM RICHARD ,  UITTERDIJK TAMMO

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

Abstract: In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.