公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2011129951A

公开(公告)日：2011-06-30

申请号：JP2011033186

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic apparatus.
SOLUTION: A cleaning apparatus for immersion lithographic apparatus comprises a substrate table so configured as to hold a substrate, a projection system PS configured to project a patterned radiation beam onto the substrate, a megasonic transducer 20 configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithographic projection apparatus is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 解决方案：一种用于浸没式光刻设备的清洁设备，包括：被配置为保持基板的基板台，配置成将图案化的辐射束投影到基板上的投影系统PS，配置成清洁表面的兆声换能器20，以及 液体供应系统，构造成在所述兆声换能器和待清洁表面之间提供液体。 浸没式光刻投影装置的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071535A

公开(公告)日：2011-04-07

申请号：JP2010260034

申请日：2010-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic device. SOLUTION: The lithographic device includes: a substrate table WT configured to hold a substrate; a projection system configured to project a patterned radiation beam onto the substrate; a megasonic transducer 20 configured to clean a surface; and a liquid supply system configured to supply a liquid between the megasonic transducer 20 and the surface to be cleaned. A surface of an immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer 20 configured to clean the surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 光刻设备包括：被配置为保持衬底的衬底台WT; 投影系统，被配置为将图案化的辐射束投影到所述衬底上; 构造成清洁表面的兆声换能器20; 以及液体供应系统，其构造成在所述兆声换能器20和待清洁表面之间提供液体。 浸没光刻投影仪的表面使用被配置为清洁表面的兆声传感器20产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT