公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2011124569A

公开(公告)日：2011-06-23

申请号：JP2010263517

申请日：2010-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KANEKO TAKESHI ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning a contaminated surface of the lithographic apparatus. SOLUTION: The liquid confinement structure is equipped with at least of two openings 10 used for supplying a liquid to a gap below the structure and extracting it. Flow direction between openings can be switched. A supplying line for supplying the liquid to a gap outside the radial direction of openings adapted to two-layer flow and supplying the liquid to the liquid confinement structure, and an extracting line for extracting the liquid from the liquid confinement structure, have an inner surface having corrosion resistance against organic liquid. A corrosive cleaning liquid can be used for cleaning a photoresist contamination. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于清洁光刻设备的污染表面的方法和设备。 解决方案：液体限制结构至少配备有用于将液体供给到结构下方的间隙的两个开口10并将其提取。 开关之间的流动方向可以切换。 一种用于将液体供应到适于两层流动的开口的径向外的间隙并将液体供应到液体限制结构的供应管线和用于从液体限制结构中提取液体的提取管线具有内表面 对有机液体具有耐腐蚀性。 腐蚀性清洁液可用于清洁光致抗蚀剂污染物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2008277819A

公开(公告)日：2008-11-13

申请号：JP2008114096

申请日：2008-04-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can be cleaned easily and effectively, and to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool that cleans the surface of a liquid containment system of the immersionm lithoraphic apparatus is disclosed and the liquid containment system has an aperture, through which radial beams can pass the liquid containment system of an immersion lithographic apparatus; the cleaning tool commprises an sonic transducer; a reservoir that holds liquid between the sonic transducer and the surface to be cleaned, and a barrier disposed under the aperture within the reservoir, in order to form a shield against sonic waves, when it is used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效清洁浸没式光刻设备的方法。 公开了一种清洁浸渍液体装置的液体容纳系统的表面的清洁工具，并且液体容纳系统具有孔，径向束可以通过该孔径通过浸没式光刻设备的液体容纳系统; 清洁工具会使声音传感器发生变化; 储存器，其在声音换能器和待清洁表面之间保持液体，以及设置在储存器内的孔下方的屏障，以便在使用时形成防止声波的屏蔽。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011097108A

公开(公告)日：2011-05-12

申请号：JP2011028118

申请日：2011-02-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which carries out cleaning readily and effectively, and also to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, and the liquid confinement system has an aperture to allow passage of a beam of radiation through the liquid confinement system of an immersion lithographic apparatus. The cleaning tool includes: a sonic transducer; a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned; and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种易于有效地进行清洁的光刻设备，并且还提供一种有效地清洗浸没式光刻设备的方法。 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，并且液体限制系统具有允许辐射束通过浸没式光刻的液体限制系统的孔 仪器。 清洁工具包括：声音换能器; 储存器，构造成在声音换能器和要清洁的表面之间保持液体; 以及位于孔下方的储存器中的屏障，在使用中形成对声波的屏蔽。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011082511A

公开(公告)日：2011-04-21

申请号：JP2010212952

申请日：2010-09-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOEKERD KORNELIS TIJMEN ,  DE GRAAF ROELOF FREDERIK ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  VAN DER GRAAF SANDRA ,  PADIY ALEXANDRE VIKTOROVYCH

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03F7/70925 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：将要在所需工作区域中的基础液体和乳化成分的比率的清洗液供给到要清洁的浸渍系统。 解决方案：清洁液体供给装置构造成将乳化的清洁流体供应到浸没式光刻设备。 该装置包括混合器，其被配置为将来自添加剂流体供应部分的添加剂流体和来自浸没供应部分的浸没液体混合以制备乳化清洁流体;被配置为感测乳化清洁流体的物理特性的传感器系统，以及 连接到传感器和混合器的控制器。 控制器控制添加剂流体从添加剂流体供应部分到混合器的供应以及乳化清洁流体的物理特性。 版权所有（C）2011，JPO＆INPIT