公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.