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公开(公告)号：WO2014072149A2
公开(公告)日：2014-05-15
申请号：PCT/EP2013071141
申请日：2013-10-10
Applicant: ASML NETHERLANDS BV
Inventor： LOOPSTRA ERIK , YAKUNIN ANDREI , BANINE VADIM , NIKIPELOV ANDREY , OSORIO OLIVEROS EDGAR , STRUYCKEN ALEXANDER , VAN DRIEËNHUIZEN BERT , VAN SCHOOT JAN
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target at a plasma formation location and directing a continuous-wave excitation beam at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置处提供连续更新的燃料目标并且在等离子体形成位置处引导连续波激发光束，使得连续更新的燃料靶内的燃料被连续波激发光束激发以产生辐射产生 等离子体。
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公开(公告)号：WO2014063878A3
公开(公告)日：2014-10-09
申请号：PCT/EP2013069713
申请日：2013-09-23
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BANINE VADIM , YAKUNIN ANDREI
CPC classification number: G03F7/70033 , G02B17/0657 , G02B17/0808 , G03F7/70041 , G03F7/7005 , H05G2/006 , H05G2/008
Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.
Abstract translation: 用于光刻设备的辐射源使用多个光纤激光器在点火位置点燃燃料液滴以产生EUV辐射。 可以将光纤激光器设置成平行于光轴发射，并且提供伸缩光学系统以将激光器聚焦在点火位置，或者激光器可以被引导到光轴，最终聚焦透镜用于减小光束腰部 。 激光器可以以两个或更多个组提供，以允许它们被独立控制，并且一些激光器可以聚焦在不同的位置以提供预脉冲。 光纤激光器的辐射也可以使用二向色镜来组合。
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公开(公告)号：WO2014202585A3
公开(公告)日：2015-08-20
申请号：PCT/EP2014062691
申请日：2014-06-17
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , FRIJNS OLAV , DE VRIES GOSSE , LOOPSTRA ERIK , BANINE VADIM , DE JAGER PIETER , DONKER RILPHO , NIENHUYS HAN-KWANG , KRUIZINGA BORGERT , ENGELEN WOUTER , LUITEN OTGER , AKKERMANS JOHANNES , GRIMMINCK LEONARDUS , LITVINENKO VLADIMIR
IPC: H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G02B26/02 , G03F7/20 , G21K1/10 , H01S3/00 , H05H7/04
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.
Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器（FEL）产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备（LA），其中所述方法还包括减小波动 通过使用基于反馈的控制回路（CT）来监测自由电子激光器并相应地调节自由电子激光器的操作，将EUV辐射的功率传递到光刻基板。
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公开(公告)号：WO2015044182A3
公开(公告)日：2015-09-24
申请号：PCT/EP2014070335
申请日：2014-09-24
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , BARTRAIJ PETRUS , VAN GORKOM RAMON , AMENT LUCAS , DE JAGER PIETER , DE VRIES GOSSE , DONKER RILPHO , ENGELEN WOUTER , FRIJNS OLAV , GRIMMINCK LEONARDUS , KATALENIC ANDELKO , LOOPSTRA ERIK , NIENHUYS HAN-KWANG , NIKIPELOV ANDREY , RENKENS MICHAEL , JANSSEN FRANCISCUS , KRUIZINGA BORGERT
IPC: G03F7/20 , G01N21/956 , G02B5/18 , G02B27/00 , G02B27/09 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , G03F1/84 , G21K1/06 , H01S3/09 , H05H7/04
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。
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公开(公告)号：NL2010232A
公开(公告)日：2013-03-19
申请号：NL2010232
申请日：2013-02-01
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BANINE VADIM , IVANOV VLADIMIR , DIJKSMAN JOHAN , YAKUNIN ANDREI
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Patent Agency Ranking
公开(公告)号：NL2011484A
公开(公告)日：2014-04-29
申请号：NL2011484
申请日：2013-09-23
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BANINE VADIM , YAKUNIN ANDREI
IPC: G03F7/20
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公开(公告)号：NL2011580A
公开(公告)日：2014-05-08
申请号：NL2011580
申请日：2013-10-10
Applicant: ASML NETHERLANDS BV
Inventor： LOOPSTRA ERIK , YAKUNIN ANDREI , BANINE VADIM , NIKIPELOV ANDREY , OSORIO OLIVEROS EDGAR , STRUYCKEN ALEXANDER , DRIE NHUIZEN BERT , SCHOOT JAN
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公开(公告)号：CA3149349A1
公开(公告)日：2021-03-04
申请号：CA3149349
申请日：2020-08-20
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BALTUSSEN SANDER , BANINE VADIM YEVGENYEVICH , DOLGOV ALEXANDR , DONMEZ NOYAN INCI , HOUWELING ZOMER SILVESTER , NOTENBOOM ARNOUD WILLEM , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER , VLES DAVID FERDINAND , VORONINA VICTORIA , YEGEN HALIL GOKAY
IPC: G03F1/62 , C01B32/158 , D01F9/12 , D01F11/12 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：NL2011761A
公开(公告)日：2014-01-13
申请号：NL2011761
申请日：2013-11-08
Applicant: ASML NETHERLANDS BV
Inventor： KUZNETSOV ALEXEY , BOOGAARD ARJEN , HUIJBREGTSE JEROEN , NIKIPELOV ANDREY , KAMPEN MAARTEN
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