公开(公告)号：WO2014202585A3

公开(公告)日：2015-08-20

申请号：PCT/EP2014062691

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  DE VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  DE JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G02B26/02 ,  G03F7/20 ,  G21K1/10 ,  H01S3/00 ,  H05H7/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器（FEL）产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备（LA），其中所述方法还包括减小波动 通过使用基于反馈的控制回路（CT）来监测自由电子激光器并相应地调节自由电子激光器的操作，将EUV辐射的功率传递到光刻基板。

公开(公告)号：WO2015044182A3

公开(公告)日：2015-09-24

申请号：PCT/EP2014070335

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

公开(公告)号：SG11201601454WA

公开(公告)日：2016-03-30

申请号：SG11201601454W

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013663A

公开(公告)日：2015-05-07

申请号：NL2013663

申请日：2014-10-22

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  AMENT LUCAS ,  BANINE VADIM ,  COENEN TEIS JOHAN ,  JAGER PIETER ,  VRIES GOSSE ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  LUITEN OTGER ,  NIKIPELOV ANDREY

IPC: G03F7/20 ,  H01S3/00

公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013014A

公开(公告)日：2014-12-22

申请号：NL2013014

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: G03F7/20

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.