公开(公告)号：WO2015044182A3

公开(公告)日：2015-09-24

申请号：PCT/EP2014070335

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

公开(公告)号：SG193240A1

公开(公告)日：2013-10-30

申请号：SG2013065149

申请日：2012-02-22

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS FELIX ,  BENSCHOP JOZEF ,  RENKENS MICHAEL ,  VAN BAARS GREGOR ,  DEKKERS JEROEN

Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target (40) onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target (42). The system further includes a radiation detector (41) to detect radiation from one of the spots, and a controller (46) to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

公开(公告)号：NL2008292A

公开(公告)日：2012-09-12

申请号：NL2008292

申请日：2012-02-15

Applicant: ASML NETHERLANDS BV

Inventor： JEUNINK ANDRE ,  PEETERS FELIX ,  RENKENS MICHAEL ,  VERHEGGEN PAUL

IPC: G03F7/20

公开(公告)号：NL2008329A

公开(公告)日：2012-10-02

申请号：NL2008329

申请日：2012-02-22

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS FELIX ,  BENSCHOP JOZEF ,  RENKENS MICHAEL ,  BAARS GREGOR ,  DEKKERS JEROEN

IPC: G03F7/20

公开(公告)号：NL2006929A

公开(公告)日：2012-02-13

申请号：NL2006929

申请日：2011-06-14

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  HARDEMAN TOON ,  SCHOTHORST GERARD ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  FOCKERT GEORGE ,  BAARS GREGOR ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：SG11201601454WA

公开(公告)日：2016-03-30

申请号：SG11201601454W

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2007129A

公开(公告)日：2012-02-14

申请号：NL2007129

申请日：2011-07-18

Applicant: ASML NETHERLANDS BV

Inventor： KOEVOETS ADRIANUS ,  RENKENS MICHAEL ,  WUISTER SANDER

IPC: G03F7/00

公开(公告)号：NL2004735A

公开(公告)日：2011-01-10

申请号：NL2004735

申请日：2010-05-18

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  KOEVOETS ADRIANUS ,  SCHIFFART CATHARINUS ,  BANINE VADIM ,  BOEF ARIE ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  SCHOTHORST GERARD ,  DIJKSMAN JOHAN ,  SCHOORMANS CAROLUS ,  WUISTER SANDER

IPC: G03F7/00