e-빔 장치
    1.
    发明公开
    e-빔 장치 审中-公开

    公开(公告)号:KR20200135878A

    公开(公告)日:2020-12-03

    申请号:KR20207031525

    申请日:2019-04-23

    Abstract: e-빔장치가개시되고, 상기장치는대상물상으로 e-빔을투영하도록구성되는전자광학기시스템(500), 대상물을유지하는대상물테이블, 및전자광학기시스템에대해대상물테이블(520)을이동시키도록구성되는위치설정디바이스(510)를포함한다. 위치설정디바이스는전자광학기시스템에대해대상물테이블을이동시키도록구성되는단행정스테이지(512) 및전자광학기시스템에대해단행정스테이지를이동시키도록구성되는장행정스테이지(511)를포함한다. e-빔장치는위치설정디바이스에의해발생되는자기교란으로부터전자광학기시스템을차폐하기위한자기차폐부(540)를더 포함한다. 자기차폐부는위치설정디바이스와전자광학기시스템사이에배치될수 있다.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.

    公开(公告)号:NL2008007A

    公开(公告)日:2012-07-23

    申请号:NL2008007

    申请日:2011-12-21

    Abstract: A lithographic apparatus comprises an object table for receiving an object, an actuator for moving the object table and a handler for transferring the object to or from the object table. The apparatus is provided with a controller operable connected with the actuator and/or the handler. The controller is programmed and/or arranged to drive the actuator and the handler so as to provide that the object table and the handler substantially follow each other in a direction perpendicular to a transfer direction during transfer in the transfer direction of the object to or from the object table.

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