公开(公告)号：NL2004425A

公开(公告)日：2010-10-28

申请号：NL2004425

申请日：2010-03-18

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  JONGH ROBERTUS

IPC: G03F7/20

公开(公告)号：NL2003223A

公开(公告)日：2010-03-31

申请号：NL2003223

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BOEIJ WILHELMUS ,  BUTLER HANS ,  JONGH ROBERTUS ,  SCHOOT JAN ,  SENGERS TIMOTHEUS ,  WIJCKMANS MAURICE ,  JANSSEN FRANCISCUS

IPC: G03F7/20

公开(公告)号：NL2003193A

公开(公告)日：2010-03-09

申请号：NL2003193

申请日：2009-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  JONGH ROBERTUS ,  WIJST MARC ,  TOUSAIN ROB ,  NIJHUIS MARCO OUDE ,  KOEVOETS ADRIANUS

IPC: G03F7/20

Abstract: A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20), determines an expected deviation of the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).