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公开(公告)号：JP2010147506A
公开(公告)日：2010-07-01
申请号：JP2010059515
申请日：2010-03-16
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： WIJCKMANS MAURICE , CUIJPERS MARTINUS AGNES WILLEM , DE JONG FREDERIK EDUARD , VAN GOMPEL EDWIN AUGUSTINUS MATHEUS , JANSEN ROB , KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA , CADEE THEODORUS PETRUS MARIA , SMEETS MARTIN FRANS PIERRE , VAN DER MEULEN FRITS , SIMONS WILHELMUS FRANCISCUS JOHANNES , ANTONIUS LEENDERS MARTINUS HENDRIKUS , OTTENS JOOST JEROEN , VAN BAREN MARTIJN
IPC: H01L21/027 , G02B21/00 , G02B21/26 , G02B21/30
CPC classification number: G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus to which countermeasures are applied for suppressing influence of pressure variation of a conditioning fluid on a substrate table. SOLUTION: This lithographic apparatus is disclosed that projects a pattern from a patterning device onto a substrate. The lithographic apparatus includes a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and suppresses a pressure variation in the conditioning system. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻设备，其中应用了对策来抑制调理流体对基片台的压力变化的影响。 解决方案：公开了将图案形成装置的图案投影到基板上的该光刻设备。 光刻设备包括被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括与调节系统流体连通并抑制调节系统中的压力变化的压力调节器。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2007281462A
公开(公告)日：2007-10-25
申请号：JP2007090110
申请日：2007-03-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： WIJCKMANS MAURICE , CUIJPERS MARTINUS AGNES WILLEM , DE JONG FREDERIK EDUARD , VAN GOMPEL EDWIN AUGUSTINUS MA , JANSEN ROB , KUSTERS GERARDUS ADRIANUS ANTO , CADEE THEODORUS PETRUS MARIA , SMEETS MARTIN FRANS PIERRE , VAN DER MEULEN FRITS , SIMONS WILHELMUS FRANCISCUS JO , ANTONIUS LEENDERS MARTINUS HEN , OTTENS JOOST JEROEN , VAN BAREN MARTIJN
IPC: H01L21/027 , G03F7/20 , H01L21/68
CPC classification number: G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT
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公开(公告)号：WO2013083335A3
公开(公告)日：2013-09-06
申请号：PCT/EP2012071688
申请日：2012-11-02
Applicant: ASML NETHERLANDS BV
Inventor： HOOGKAMP JAN , JANSEN BASTIAAN , WIJCKMANS MAURICE
CPC classification number: G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/7085 , H01J37/32339 , H01J2237/04 , H01J2237/327 , H05G2/005 , H05G2/008
Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.
Abstract translation: 适合于向光刻设备的照明器提供辐射束的辐射源（SO）。 辐射源包括被配置为沿着轨迹（140）引导燃料液滴流朝向等离子体形成位置（212）的喷嘴（128）。 辐射源被配置为接收第一量的辐射（205），使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上。 第一量的辐射将能量传递到燃料液滴以产生发射第二量的辐射的辐射产生等离子体（132）。 辐射源还包括具有第一传感器装置（122）和第二传感器装置（134）的对准检测器。 第一传感器装置被配置为测量指示第一辐射量的焦点位置的第三量的辐射（205a）的性质。 第二传感器装置被配置成测量第四量的辐射（138）的性质，第四辐射量是被第一辐射量入射的燃料液滴反射的第一辐射量的一部分 。
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公开(公告)号：NL2010306A
公开(公告)日：2013-04-09
申请号：NL2010306
申请日：2013-02-15
Applicant: ASML NETHERLANDS BV
Inventor： WIJCKMANS MAURICE , TEGENBOSCH HENRICUS , SWINKELS GERARDUS
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Patent Agency Ranking
公开(公告)号：NL2003772A
公开(公告)日：2010-06-14
申请号：NL2003772
申请日：2009-11-09
Applicant: ASML NETHERLANDS BV
Inventor： LOOPSTRA ERIK , WIJCKMANS MAURICE , TOUSAIN ROB , KOEVOETS ADRIANUS
IPC: G03F7/20
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公开(公告)号：DE102019131987A1
公开(公告)日：2020-01-16
申请号：DE102019131987
申请日：2019-11-26
Applicant: ASML NETHERLANDS BV , ZEISS CARL SMT GMBH
Inventor： DE JONGH ROBERTUS JOHANNES MARINUS , WIJCKMANS MAURICE , MUTSAERS MARK , GEUPPERT BERNHARD , STARREVELD JEOREN , QADIR ASMA
Abstract: Ein optisches System (200), insbesondere ein Projektionssystem (104), für eine Lithographieanlage (100A, 100B), aufweisend ein erstes optisches Element (202), ein zweites optisches Element (204), einen Sensorrahmen (222), einen ersten Tragrahmen (208), welcher das erste optische Element (202) trägt, und einen von dem ersten Tragrahmen (208) getrennten zweiten Tragrahmen (210), welcher sowohl das zweite optische Element (204) als auch den Sensorrahmen (222) trägt.
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公开(公告)号：NL2003223A
公开(公告)日：2010-03-31
申请号：NL2003223
申请日：2009-07-17
Applicant: ASML NETHERLANDS BV
Inventor： LOOPSTRA ERIK , BOEIJ WILHELMUS , BUTLER HANS , JONGH ROBERTUS , SCHOOT JAN , SENGERS TIMOTHEUS , WIJCKMANS MAURICE , JANSSEN FRANCISCUS
IPC: G03F7/20
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公开(公告)号：SG136117A1
公开(公告)日：2007-10-29
申请号：SG2007025513
申请日：2007-04-05
Applicant: ASML NETHERLANDS BV
Inventor： WIJCKMANS MAURICE , CUIJPERS MARTINUS AGNES WILLEM , DE JONG FREDERIK EDUARD , VAN GOMPEL EDWIN AUGUSTINUS MA , JANSEN ROB , KUSTERS GERARDUS ADRIANUS ANTO , CADEE THEODORUS PETRUS MARIA , SMEETS MARTIN FRANS PIERRE , VAN DER MEULEN FRITS , SIMONS WILHELMUS FRANCISCUS JO , LEENDERS MARTINUS HENDRIKUS AN , OTTENS JOOST JEROEN , VAN BAREN MARTIJN
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公开(公告)号：NL2009743A
公开(公告)日：2012-11-20
申请号：NL2009743
申请日：2012-11-02
Applicant: ASML NETHERLANDS BV
Inventor： HOOGKAMP JAN , JANSEN BASTIAAN , WIJCKMANS MAURICE
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