中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.027 seconds)

    Lithographic apparatus
    2.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2012191205A

    公开(公告)日：2012-10-04

    申请号：JP2012047558

    申请日：2012-03-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  OTTENS JOOST JEROEN ,  EUSSEN EMIEL JOZEF MELANIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  WILLIAM PETER VAN DRENT ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  ERIK WILLEM BOGAART

    IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

    CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a position measurement system for accurately measuring a substrate table position.SOLUTION: The lithographic apparatus comprises: a substrate table position measurement system for measuring a substrate table position; and a projection system position measurement system for measuring a projection system position. The substrate table position measurement system comprises: a substrate table reference element mounted on the substrate table; and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to a holding plane of a substrate on the substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

    Abstract translation: 要解决的问题：提供一种包括用于精确测量衬底台位置的位置测量系统的光刻设备。 光刻设备包括：用于测量衬底台位置的衬底台位置测量系统; 以及用于测量投影系统位置的投影系统位置测量系统。 衬底台位置测量系统包括：安装在衬底台上的衬底台参考元件; 和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。 版权所有（C）2013，JPO＆INPIT

    Structure of level sensor for lithographic apparatus and method for manufacturing device
    3.
    发明专利
    Structure of level sensor for lithographic apparatus and method for manufacturing device 有权
    用于平面设备的水平传感器的结构和制造设备的方法

    公开(公告)号：JP2010219528A

    公开(公告)日：2010-09-30

    申请号：JP2010052645

    申请日：2010-03-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DEN BOEF ARIE JEFFREY ,  BENSCHOP JOZEF PETRUS HENRICUS ,  BRINKHOF RALPH ,  MACHT LUKASZ JERZY

    IPC: H01L21/027

    CPC classification number: G03F9/7034 ,  G03F9/7065 ,  G03F9/7088

    Abstract: PROBLEM TO BE SOLVED: To provide the configuration and the operation of a modified level sensor.
    SOLUTION: The level sensor measures the height of a substrate surface in a lithographic apparatus, and is equipped with a light source to emit light for detection to the substrate, and a measuring unit to measure the light reflected at the substrate. The light source in the lithographic apparatus emits irradiation for detecting a wavelength range reacted by a resist used for treating the substrate.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供改进的液位传感器的配置和操作。 解决方案：液位传感器测量光刻设备中的基板表面的高度，并且配备有用于向基板发射光的光源和用于测量在基板处反射的光的测量单元。 光刻设备中的光源发射用于检测由用于处理基板的抗蚀剂反应的波长范围的照射。 版权所有（C）2010，JPO＆INPIT

    LITHOGRAPHIC APPARATUS.
    4.
    发明专利
    LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2008272A

    公开(公告)日：2012-09-11

    申请号：NL2008272

    申请日：2012-02-10

    Applicant: ASML NETHERLANDS BV

    Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Patent Agency Ranking