公开(公告)号：NL2005958A

公开(公告)日：2011-08-10

申请号：NL2005958

申请日：2011-01-06

Applicant: ASML NETHERLANDS BV

Inventor： MICKAN UWE ,  OOSTEN ANTON

IPC: G03F7/20

Abstract: A lithographic method for irradiating resist on a substrate, the resist filling a region located between a first element located on the substrate, and a second element located on the substrate, the first element having a first length, a first width, and a first height, the second element having a second length, a second width, and a second height, the first height being substantially equal to the second height, the first length being substantially parallel to the second length, and extending in a first direction, a distance between facing sidewalls of the first element and the second element that defines the region filled with resist being less than a wavelength of radiation used to irradiate the resist, the method including irradiating the resist with elliptically polarized radiation, the elliptically polarized radiation being configured such that, at the first height and second height, the elliptically polarized radiation is polarized perpendicular to the first direction, substantially perpendicular to the first and second lengths.

公开(公告)号：NL2013630A

公开(公告)日：2015-05-07

申请号：NL2013630

申请日：2014-10-14

Applicant: ASML NETHERLANDS BV

Inventor： SETTEN EELCO ,  DAVYDOVA NATALIA ,  PSARA ELENI ,  OOSTEN ANTON

IPC: H01L21/02

公开(公告)号：NL2011945A

公开(公告)日：2014-07-29

申请号：NL2011945

申请日：2013-12-12

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  WIJST MARC ,  ZAAL KOEN

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.