公开(公告)号：JP2010050454A

公开(公告)日：2010-03-04

申请号：JP2009186941

申请日：2009-08-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus by which two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized. SOLUTION: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以将两相流稳定化和/或至少基本上分离成液态和气体流并且期望地基本上最小化的装置。 解决方案：描述了一种浸没式光刻设备，其中通过使富含液体的液流优先沿着表面流动，将两相流分离成富含液体的富气流。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012238868A

公开(公告)日：2012-12-06

申请号：JP2012157590

申请日：2012-07-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHAEL ,  KUIPER ANTONY ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus by which a two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized.SOLUTION: In order to allow a liquid-rich flow to preferentially flow along a surface, gas of a two-phase flow is more easily diverted and enters a dry chamber 127 via a gap between a divider 124 and a second wall 123. The width of a channel 125, as well as a surface coating thereon if desired, encourages the liquid to enter and the gas not to enter.

Abstract translation: 要解决的问题：提供一种浸入式光刻设备，通过该浸没式光刻设备，两相流可以被稳定和/或至少基本上分离成液态和气体流，并且期望地基本上最小化。 解决方案：为了使液体丰富的流优先沿着表面流动，两相流的气体更容易转向并经由分隔件124和第二壁123之间的间隙进入干燥室127 如果需要，通道125的宽度以及其上的表面涂层鼓励液体进入并且气体不进入。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：NL2003226A

公开(公告)日：2010-03-09

申请号：NL2003226

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  ANTONEVICI ANCA ,  KATE NICOLAAS ,  OTTENS JOOST ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES

IPC: G03F7/20