公开(公告)号：WO2013113568A3

公开(公告)日：2013-12-12

申请号：PCT/EP2013050818

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/0081 ,  B23K26/342 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder (100) for a lithographic apparatus has a main body having a thin-film stack (110) provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls (106) to support a substrate (W) are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器（100）具有在其表面上设置有薄膜叠层（110）的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜堆叠或薄膜叠层的孔中形成有用于支撑基板（W）的多个毛刺（106）。

公开(公告)号：NL2010140A

公开(公告)日：2013-08-06

申请号：NL2010140

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2010472A

公开(公告)日：2013-10-23

申请号：NL2010472

申请日：2013-03-19

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH ,  SINGH HARMEET

IPC: H01L21/683 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.

公开(公告)号：NL2010139A

公开(公告)日：2013-08-06

申请号：NL2010139

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2009487A

公开(公告)日：2013-04-16

申请号：NL2009487

申请日：2012-09-19

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH ,  DELFT PETER

IPC: G03F7/20 ,  H01L21/683