中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

12 records (took 0.029 seconds)

    Lithographic device and method of manufacturing the same
    3.
    发明专利
    Lithographic device and method of manufacturing the same 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008258613A

    公开(公告)日：2008-10-23

    申请号：JP2008085232

    申请日：2008-03-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK R ,  COX HENRIKUS HERMAN MARIE ,  MERTENS JEROEN JOHANNES SOPHIA ,  SIMONS WILHELMUS FRANCISCUS JO ,  BERKVENS PAUL PETRUS JOANNES

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

    Abstract: PROBLEM TO BE SOLVED: To provide a position control system for a lithographic device in which an accuracy of positioning a target portion with respect to a lens column or a projection system may be improved. SOLUTION: The position control system for a substrate support of a lithographic device includes a position measurement system constructed to specify a position of a sensor or a sensor target on the substrate support, a controller constructed to provide a control signal based on a desired position of a target portion of the substrate and the specified position, and one or more actuators constructed to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, which includes a relation between a difference in a change in a position of the target portion and a change in position of the sensor or sensor target, as a result of a force exerted on the substrate support. The position control system is constructed to substantially correct the position of the target portion using the stiffness compensation model at least during projection of a patterned radiation beam on the target portion. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光刻设备的位置控制系统，其中可以提高目标部分相对于透镜柱或投影系统的定位精度。 解决方案：用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，其被构造成指定传感器或传感器目标在基板支撑件上的位置;控制器，被构造成提供基于 基板的目标部分和指定位置的期望位置，以及构造成作用在基板支撑件上的一个或多个致动器。 位置控制系统包括基板支撑件的刚度补偿模型，其包括目标部分的位置变化的差异与传感器或传感器目标的位置变化之间的关系，作为施加的力 在基板支撑上。 位置控制系统被构造成至少在图案化的辐射束在目标部分的投影期间使用刚度补偿模型来基本上校正目标部分的位置。 版权所有（C）2009，JPO＆INPIT

    Controller for positioning device, method for controlling positioning device, positioning device, and lithographic apparatus equipped with positioning device
    5.
    发明专利
    Controller for positioning device, method for controlling positioning device, positioning device, and lithographic apparatus equipped with positioning device 有权
    用于定位装置的控制器，用于控制定位装置的方法，定位装置和装备有定位装置的平面装置

    公开(公告)号：JP2009152604A

    公开(公告)日：2009-07-09

    申请号：JP2008320578

    申请日：2008-12-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HEERTJES MARCEL FRANCOIS ,  SIMONS WILHELMUS FRANCISCUS JO ,  DENNIS ANDREAS PETRUS HUBERTIN ,  GOOSSENS JEFFREY HENDRIKUS PET

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G06F19/00 ,  G03F7/70725 ,  G03F9/7092

    Abstract: PROBLEM TO BE SOLVED: To provide a variable gain controller lower in sensitivity of noise amplification. SOLUTION: A controller for positioning device is constructed and arranged to: receive a position signal indicative of a position of a positioning device; compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal; selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal; and generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供噪声放大灵敏度较低的可变增益控制器。 解决方案：一种用于定位装置的控制器被构造和布置成：接收指示定位装置的位置的位置信号; 将位置信号与指示定位装置的期望位置的设定点信号进行比较以获得误差信号; 基于误差信号的幅度和频率内容选择性地修改误差信号，以获得修正的误差信号; 并且基于修正的误差信号产生用于控制定位装置的控制信号。 可以应用控制器来控制光刻设备中的定位装置。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    7.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008028392A

    公开(公告)日：2008-02-07

    申请号：JP2007185824

    申请日：2007-07-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN ,  SIMONS WILHELMUS FRANCISCUS JO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide an improved controlling system for a lithographic apparatus and the lithographic apparatus having the same. SOLUTION: A controlling system for controlling a position parameter of a stage in a lithographic apparatus has a stage controller for controlling at least a position parameter of a stage at least in a first direction. The controlling system has a disturbance torque estimator for estimating a disturbance torque on a stage around an axis line extended in a second direction which is substantially orthogonal to the first direction. The controlling system has a correcting signal calculator to which the estimated disturbance torque and a signal which represents a position of a stage extended in a third direction which is substantially orthogonal to the first and second directions are provided. The correcting signal calculator determines a feed forward correcting signal for correcting a position error of the stage extended in the first direction caused by the disturbance torque. The feed forward correcting signal is provided to the stage. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光刻设备和具有该光刻设备的光刻设备的改进的控制系统。 解决方案：用于控制光刻设备中的台的位置参数的控制系统具有级控制器，用于至少在第一方向上至少控制平台的位置参数。 所述控制系统具有干扰转矩估计器，用于估计在与所述第一方向基本正交的第二方向上延伸的轴线周围的台上的扰动转矩。 控制系统具有校正信号计算器，所述校正信号计算器提供估计的干扰转矩和表示在与第一和第二方向基本正交的第三方向上延伸的平台的位置的信号。 校正信号计算器确定用于校正由干扰转矩引起的在第一方向上延伸的级的位置误差的前馈校正信号。 前馈校正信号被提供给舞台。 版权所有（C）2008，JPO＆INPIT

    Lithographic device, stage system, and stage control method
    9.
    发明专利
    Lithographic device, stage system, and stage control method 有权
    平面设备，舞台系统和舞台控制方法

    公开(公告)号：JP2009152591A

    公开(公告)日：2009-07-09

    申请号：JP2008316314

    申请日：2008-12-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHNEIDERS MAURITIUS GERARDUS ,  SIMONS WILHELMUS FRANCISCUS JO

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device improving a dynamic characteristic of a stage. SOLUTION: The lithographic device includes the stage system, which in turn includes a moving stage and a stage control system controlling the position of the stage in response to a setting signal. The stage control system has a feedback control loop used for controlling a position by a feedback method, and including set value input, and acceleration feedforward generating a feedforward signal to be delivered to the feedback control loop on the front side. The feedforward signal is derived from the setting signal. The stage control system is structured such that a position setting signal is changed to a changed position setting signal, the set value input of the feedback control loop receives the changed position setting signal, and the changed position setting signal takes a nonrigid behavior of the stage into account. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供改善载物台的动态特性的光刻设备。 解决方案：光刻设备包括舞台系统，舞台系统又包括移动舞台，舞台控制系统响应于设定信号控制舞台的位置。 舞台控制系统具有用于通过反馈方法控制位置的反馈控制回路，并且包括设定值输入和加速度前馈，产生要传送到前侧的反馈控制回路的前馈信号。 前馈信号是从设定信号导出的。 台架控制系统被构造为使得位置设定信号变为改变位置设定信号，反馈控制回路的设定值输入接收改变位置设定信号，变更位置设定信号采取舞台的非刚性动作 考虑到 版权所有（C）2009，JPO＆INPIT

Patent Agency Ranking