公开(公告)号：NL2007439A

公开(公告)日：2012-04-23

申请号：NL2007439

申请日：2011-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DAM MARINUS ,  JASPER JOHANNES ,  HAM RONALD ,  SHULEPOV SERGEI ,  PIETERSE GERBEN ,  BARAGONA MARCO ,  DEBRAUWER PIETER ,  STEEN ANTONIUS

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.

公开(公告)号：NL2008184A

公开(公告)日：2012-08-29

申请号：NL2008184

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DEBRAUWER PIETER ,  STEEN ANTONIUS ,  KOLDEWEIJ ROBIN

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.