公开(公告)号：JP2011159971A

公开(公告)日：2011-08-18

申请号：JP2011014673

申请日：2011-01-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  MAIKEL ADRIANUS CORNELIS SCHEPERS ,  SERGEI SHULEPOV ,  PIETER MULDER ,  BESSEMS DAVID ,  BARAGONA MARCO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for preventing bubbles from entering a projection beam during image formation. SOLUTION: In a liquid confinement structure of an immersion lithographic apparatus, an elongate continuous opening forms an outlet for supplying liquid to a space beneath a projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from an image field. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在图像形成期间防止气泡进入投影光束的光刻设备。 解决方案：在浸没式光刻设备的液体限制结构中，细长的连续开口形成用于将液体供应到投影系统下方的空间的出口。 细长狭缝形成高剪切和压力梯度的区域，其使气泡偏离图像场。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2006272A

公开(公告)日：2011-11-07

申请号：NL2006272

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： HAM RONALD ,  BARAGONA MARCO ,  GROEN ROBERTUS ,  MAESSEN RALPH ,  TOONDER JACOB ,  KOVACEVIC-MILIVOJEVIC MILICA ,  LEENDERS MARTINUS ,  MULKENS JOHANNES ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  CROMWIJK JAN ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

公开(公告)号：NL2007439A

公开(公告)日：2012-04-23

申请号：NL2007439

申请日：2011-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DAM MARINUS ,  JASPER JOHANNES ,  HAM RONALD ,  SHULEPOV SERGEI ,  PIETERSE GERBEN ,  BARAGONA MARCO ,  DEBRAUWER PIETER ,  STEEN ANTONIUS

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.

公开(公告)号：NL2005951A

公开(公告)日：2011-08-03

申请号：NL2005951

申请日：2011-01-05

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  EUMMELEN ERIK ,  SCHEPERS MAIKEL ,  DUNGEN CLEMENS ,  SHULEPOV SERGEI ,  MULDER PIETER ,  BESSEMS DAVID ,  BARAGONA MARCO

IPC: G03F7/20