公开(公告)号：KR20210009445A

公开(公告)日：2021-01-26

申请号：KR20217001688

申请日：2017-08-28

Applicant: ASML NETHERLANDS BV

Inventor： VAN DEN EIJNDEN PEPIJN ,  ROPS CORNELIUS MARIA ,  POLET THEODORUS WILHELMUS ,  KEUKENS FLOOR LODEWIJK ,  TANASA GHEORGHE ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  CUYPERS KOEN ,  BUDDENBERG HAROLD SEBASTIAAN ,  GATTOBIGIO GIOVANNI LUCA ,  VAN VLIET EVERT ,  TEN KATE NICOLAAS ,  FRENCKEN MARK JOHANNES HERMANUS ,  VAN ERVE JANTIEN LAURA ,  TEUNISSEN MARCEL MARIA CORNELIUS FRANCISCUS

IPC: G03F7/20

Abstract: 침지유체를리소그래피장치의일부영역에국한시키도록구성된유체처리구조물(12)은, 침지액체를통해투영비임이통과하도록형성된구멍(15); 제 1 부분(100); 및제 2 부분(200)을포함하고, 제 1 부분과제 2 부분중의적어도하나는영역으로부터침지유체를빼내기위한표면(20)을형성하고, 유체처리구조물은유체처리구조물의표면에출입하는유체유동을제공하고, 제 2 부분에대한제 1 부분의운동은구멍에대한표면에출입하는유체유동의위치를변화시키는데효과적이고, 제 1 부분과제 2 부분중의하나는유체유동이통과하는적어도하나의관통공(51, 61)을포함하고, 제 1 부분과제 2 부분중의다른하나는유체유동이통과하는적어도하나의개구(55, 65)를포함하며, 적어도하나의관통공및 적어도하나의개구는서로정렬되면유체연통하고, 운동에의해적어도하나의개구가적어도하나의관통공중의하나와정렬되어, 구멍에대한표면에출입하는유체유동의위치가변하게된다.

公开(公告)号：WO2016096508A9

公开(公告)日：2016-11-10

申请号：PCT/EP2015078842

申请日：2015-12-07

Applicant: ASML NETHERLANDS BV

Inventor： ROPS CORNELIUS MARIA ,  STALS WALTER THEODORUS MATHEUS ,  BESSEMS DAVID ,  GATTOBIGIO GIOVANNI LUCA ,  BLANCO CARBALLO VICTOR MANUEL ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  VAN DER HAM RONALD ,  VAN DER ZANDEN FREDERIK ANTONIUS ,  WERNAART WILHELMUS ANTONIUS

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03B27/52 ,  B01D19/0005 ,  B01D19/0021 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

Abstract translation: 一种用于光刻设备的流体处理结构，其被配置为将浸没流体包含在区域中，所述流体处理结构在空间的边界处具有：在所述空间的径向向外的方向上的至少一个气刀开口; 以及至少一个气体供应开口，其在所述至少气刀开口的径向向外方向上相对于所述空间。 气刀开口和气体供应开口都提供基本上纯的CO 2气体，以便在空间附近和径向向外提供基本上纯的CO 2气体环境。