公开(公告)号：KR20210009445A

公开(公告)日：2021-01-26

申请号：KR20217001688

申请日：2017-08-28

Applicant: ASML NETHERLANDS BV

Inventor： VAN DEN EIJNDEN PEPIJN ,  ROPS CORNELIUS MARIA ,  POLET THEODORUS WILHELMUS ,  KEUKENS FLOOR LODEWIJK ,  TANASA GHEORGHE ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  CUYPERS KOEN ,  BUDDENBERG HAROLD SEBASTIAAN ,  GATTOBIGIO GIOVANNI LUCA ,  VAN VLIET EVERT ,  TEN KATE NICOLAAS ,  FRENCKEN MARK JOHANNES HERMANUS ,  VAN ERVE JANTIEN LAURA ,  TEUNISSEN MARCEL MARIA CORNELIUS FRANCISCUS

IPC: G03F7/20

Abstract: 침지유체를리소그래피장치의일부영역에국한시키도록구성된유체처리구조물(12)은, 침지액체를통해투영비임이통과하도록형성된구멍(15); 제 1 부분(100); 및제 2 부분(200)을포함하고, 제 1 부분과제 2 부분중의적어도하나는영역으로부터침지유체를빼내기위한표면(20)을형성하고, 유체처리구조물은유체처리구조물의표면에출입하는유체유동을제공하고, 제 2 부분에대한제 1 부분의운동은구멍에대한표면에출입하는유체유동의위치를변화시키는데효과적이고, 제 1 부분과제 2 부분중의하나는유체유동이통과하는적어도하나의관통공(51, 61)을포함하고, 제 1 부분과제 2 부분중의다른하나는유체유동이통과하는적어도하나의개구(55, 65)를포함하며, 적어도하나의관통공및 적어도하나의개구는서로정렬되면유체연통하고, 운동에의해적어도하나의개구가적어도하나의관통공중의하나와정렬되어, 구멍에대한표면에출입하는유체유동의위치가변하게된다.

公开(公告)号：JP2009260343A

公开(公告)日：2009-11-05

申请号：JP2009094473

申请日：2009-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLEMENS JOHANNES GERARDUS VAN ,  NICOLAAS FRANCISCUS KOPPELAARS ,  ANTONIUS LEENDERS MARTINUS HEN ,  LIEBREGTS PAULUS MARTINUS MARI ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  BECKERS MARCEL ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  DANNY MARIA HUBERTUS PHILIPS ,  VERHEES REMKO JAN PETER ,  PIETER MULDER ,  VAN VLIET EVERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To disclose an immersion lithographic apparatus that includes a fluid supply system for supplying a fluid. SOLUTION: The fluid supply system has a chamber with a plurality of inlet holes formed in a first sidewall and a plurality of outlet holes formed in a second sidewall, wherein the first sidewall faces the second sidewall, and the inlet holes allows fluid entering the chamber to induce in a direction towards areas of the second sidewall between the plurality of outlet holes. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种浸没式光刻设备，其包括用于供应流体的流体供应系统。 解决方案：流体供应系统具有腔室，其具有形成在第一侧壁中的多个入口孔和形成在第二侧壁中的多个出口孔，其中第一侧壁面向第二侧壁，并且入口孔允许流体 进入室以沿朝向多个出口孔之间的第二侧壁的区域的方向引诱。 版权所有（C）2010，JPO＆INPIT