公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009188383A

公开(公告)日：2009-08-20

申请号：JP2008315117

申请日：2008-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN DOOL TEUNIS CORNELIS ,  OOSTERHUIS GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B08B3/02 ,  B08B5/02 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To solve a problem of contamination to a liquid immersed lithographic apparatus introduced via immersion liquid or via another mechanism. SOLUTION: The method for cleaning liquid immersed lithographic apparatus utilizes an aerosol spray to be guided to the surface to be cleaned. The aerosol spray utilizes an inert gas such as nitrogen or carbon dioxide, and as a solid or a liquid, water such as ultrapure water, another solvent or a cleaning fluid. Spray from the aerosol is enclosed in a space. If the aerosol collides with the surface to be cleaned, contaminated substances are removed. The removed contaminating substances are guided to an aerosol spray orifice or an outlet together with substances discharged from the outlet (a gas and a liquid and/or a solid). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：解决通过浸没液引入的液浸式光刻设备或通过其他机构的污染问题。 解决方案：用于清洗液浸光刻设备的方法利用气溶胶喷雾器被引导到待清洁的表面。 气溶胶喷雾使用惰性气体如氮气或二氧化碳，以及作为固体或液体的水，例如超纯水，另一溶剂或清洗液。 从气溶胶喷雾被封闭在一个空间中。 如果气溶胶与要清洁的表面碰撞，则污染物质被去除。 去除的污染物质与从出口排放的物质（气体和液体和/或固体）一起被引导到气溶胶喷雾孔或出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008153651A

公开(公告)日：2008-07-03

申请号：JP2007315492

申请日：2007-12-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AUER-JONGEPIER SUZAN LEONIE ,  JEROEN JOHANNES SOPHIA MARIA M ,  BERNHARD SPERLING FRANK ,  VAN DEN DOOL TEUNIS CORNELIS ,  MONDT EVA ,  ZDRAVKOV ALEXANDER NIKOLOV ,  VISSERS PAULUS MARTINUS HUBERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic equipment and a lithographic method which can reduce generation of bubbles in liquid. SOLUTION: The lithographic equipment comprises a substrate table for holding a substrate, a projection system which is arranged to project a radiation beam patterned on the substrate, a liquid supplying system prepared to supply liquid to a space between the projection system, the substrate and the substrate table, and a ring placed to cover a gap between the substrate and the substrate table and made contact with both of them. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少液体中气泡产生的平版印刷设备和平版印刷方法。 光刻设备包括用于保持基板的基板台，布置成将图案化在基板上的辐射束投影的投影系统，准备将液体供应到投影系统之间的空间的液体供应系统， 基板和基板台，以及放置以覆盖基板和基板台之间的间隙并与两者接触的环。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011199304A

公开(公告)日：2011-10-06

申请号：JP2011115335

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。

公开(公告)号：JP2008109132A

公开(公告)日：2008-05-08

申请号：JP2007268911

申请日：2007-10-16

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： NOORDMAN OSCAR FRANCISCUS J ,  KREUZER JUSTIN L ,  VINK HENRI JOHANNES P ,  VAN DEN DOOL TEUNIS CORNELIS ,  CALERO DANIEL PEREZ

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70558 ,  G02B26/001 ,  G03F7/70041

Abstract: PROBLEM TO BE SOLVED: To provide a variable attenuator which satisfies necessary performance conditions to be used in a sub system of a lithographic apparatus used for controlling a dose of radiation during a lithographic exposure process. SOLUTION: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可变衰减器，其满足在光刻曝光处理期间用于控制辐射剂量的光刻设备的子系统中使用的必要性能条件。 解决方案：系统和方法提供高速可变衰减器。 衰减器可以在光刻设备中使用，以控制用于在初始辐射脉冲之后校正辐射剂量的一个或多个校正脉冲中的辐射强度。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG149783A1

公开(公告)日：2009-02-27

申请号：SG2008054611

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

Abstract: Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]

公开(公告)号：SG142242A1

公开(公告)日：2008-05-28

申请号：SG2007168297

申请日：2007-10-11

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： JOZEPHUS NOORDMAN OSCAR FRANCI ,  L KREUZER JUSTIN ,  VINK HENRI JOHANNES PETRUS ,  VAN DEN DOOL TEUNIS CORNELIS ,  PEREZ CALERO DANIEL

Abstract: USING AN INTERFEROMETER AS A HIGH SPEED VARIABLE ATTENUATOR A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.