公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033162A

公开(公告)日：2009-02-12

申请号：JP2008187824

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  VAN DOMMELEN YOURI JOHANNES LA ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  DE JONG ANTHONIUS MARTINUS COR ,  CROMWIJK JAN WILLEM ,  THOMAS LAURSEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus. SOLUTION: The lithographic apparatus that includes a reflector for reflecting a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system used for cleaning. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。 公开了一种光刻设备，其包括用于将通过投影系统投射的清洁光束反射到液体回收系统的下侧的反射器。 还公开了用于照射用于清洁的液体供应系统的下侧的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009267404A

公开(公告)日：2009-11-12

申请号：JP2009100474

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WATSO ROBERT DOUGLAS ,  VAN DOMMELEN YOURI JOHANNES LA ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  JEROEN JOHANNES SOPHIA MARIA M ,  STEIJAART PETER PAUL ,  DE JONG ANTHONIUS MARTINUS COR ,  VAN DE WINKEL JIMMY MATHEUS WI ,  DA PAZ SENA JOAO PAULO ,  VAN DER LEE MAURICE MARTINUS J ,  VAN LIER HENRICUS MARTINUS DOR ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus including a cleaning station. SOLUTION: Several embodiments of a cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with a final element of a projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括清洁站的光刻投影设备。 解决方案：公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011199304A

公开(公告)日：2011-10-06

申请号：JP2011115335

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。

公开(公告)号：JP2011193017A

公开(公告)日：2011-09-29

申请号：JP2011115337

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  CROMWIJK JAN WILLEM ,  THOMAS LAURSEN

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To easily execute cleaning of contamination of a lithographic apparatus. SOLUTION: The outer (top) surface of the reflective member 100 is co-planar with an outer (top) surface of the substrate table WT. This allows the reflective member 100 to be moved under the liquid supply system 12 without turning off the supply of liquid or the leaking of liquid. In that way the immersion space can be kept full of liquid as the reflective member 100 is moved under the projection system PS so that the reflective member 100 can be used in line. Cleaning fluid is applied to the immersion space and the cleaning liquid extends between the barrier member 12 and the reflective member 100 to a porous member 21. If the under pressure applied to the other side of the porous member 21 is reduced, the meniscus extending between the liquid supply system 12 and the reflective member 100 which defines the outer most edge of liquid moves radially outwardly to the outer edge of the porous member 21. Thus, the cleaning fluid covers all of the porous member 21. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：易于执行光刻设备污染的清洁。

解决方案：反射构件100的外（顶）表面与衬底台WT的外（顶）表面共面。 这允许反射构件100在液体供应系统12下移动而不关闭液体供应或液体泄漏。 以这种方式，当反射构件100在投影系统PS下方移动时，浸没空间可以保持充满液体，使得可以使用反射构件100。 清洁液被施加到浸没空间，清洁液体在阻挡构件12和反射构件100之间延伸到多孔构件21.如果施加到多孔构件21的另一侧的下压力减小， 液体供应系统12和限定液体最外边缘的反射构件100径向向外移动到多孔构件21的外边缘。因此，清洁流体覆盖所有多孔构件21.版权：（ C）2011，JPO＆INPIT

公开(公告)号：NL1035725A1

公开(公告)日：2009-01-27

申请号：NL1035725

申请日：2008-07-18

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  NET ANTONIUS JOHANNUS VAN DER ,  WANTEN PETER FRANCISCUS ,  DONCK JACQUES COR JOHAN VAN DER ,  WATSO ROBERT DOUGLAS ,  DOOL TEUNIS CORNELIS VAN DEN ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL1036709A1

公开(公告)日：2009-10-27

申请号：NL1036709

申请日：2009-03-13

Applicant: ASML NETHERLANDS BV

Inventor： WATSO ROBERT DOUGLAS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STEIJAERT PETER PAUL ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  WINKEL JIMMY MATHEUS WILHELMUS ,  SENA JOAO PAULO DA PAZ ,  LEE MAURICE MARTINUS JOHANNES ,  LIER HENRICUS MARTINUS DOROTHE ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：SG149783A1

公开(公告)日：2009-02-27

申请号：SG2008054611

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

Abstract: Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]

公开(公告)号：NL1035712A1

公开(公告)日：2009-01-27

申请号：NL1035712

申请日：2008-07-17

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  CROMWIJK JAN WILLEM ,  LAURSEN THOMAS

IPC: G03F7/20 ,  H01L21/027