公开(公告)号：JP2011199304A

公开(公告)日：2011-10-06

申请号：JP2011115335

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。

公开(公告)号：JP2011159986A

公开(公告)日：2011-08-18

申请号：JP2011065516

申请日：2011-03-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERICK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device.
SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device, the deformable layer 2 of the cleaning substrate CW1 is brought into contact with a surface of the device from which the contamination is removed, and a relative movement between the deformable layer 2 and the surface of the device from which the contamination is removed is introduced to remove the contamination separated from an immersion hood surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在浸没式光刻装置中去除浸没罩和/或浸液的污染物的方法。 解决方案：具有刚性支撑层和设置在刚性支撑层上的可变形层的清洁基板CW1装载在该装置中，清洁基板CW1的可变形层2与装置的表面接触 污染物被去除，并且引入可变形层2和去除污染物的装置的表面之间的相对运动，以去除与浸没罩表面分离的污染物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010103530A

公开(公告)日：2010-05-06

申请号：JP2009236994

申请日：2009-10-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  VAN DER DONCK JACQUES COR JOHAN ,  GORTER HARRIE ,  VAN DER BERG JOHANNES HENDRIK

IPC: H01L21/027 ,  C11D1/722 ,  C11D3/20 ,  C11D3/43 ,  C11D17/08 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method with which a surface of a lithographic apparatus can be effectively cleaned. SOLUTION: The lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt.% water; from 1 to 74.99 wt.% solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt.% surfactant. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供可以有效地清洁光刻设备的表面的系统和方法。 解决方案：光刻设备包括被配置为向要清洁的表面提供清洁流体的流体供应系统。 清洗流体包括25至98.99重量％的水; 1至74.99重量％的溶剂，其选自一种或多种二醇醚，酯，醇和酮; 和0.01至5重量％的表面活性剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：WO2009152885A8

公开(公告)日：2010-05-20

申请号：PCT/EP2009001581

申请日：2009-03-06

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV ,  EHM DIRK HEINRICH ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CZAP ALMUT ,  NAGEL MONA ,  VAN DER DONCK JACQUES COR JOHA ,  STORTELDER JETSKE ,  SANDTKE MARIJN ,  CABALLERO MARIA ISABEL CATALIN ,  SCACCABAROZZI LUIGI

Inventor： EHM DIRK HEINRICH ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  CZAP ALMUT ,  NAGEL MONA ,  VAN DER DONCK JACQUES COR JOHAN ,  STORTELDER JETSKE ,  SANDTKE MARIJN ,  CABALLERO MARIA ISABEL CATALINA ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  G21K1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

Abstract: An optical assembly serves the purpose of being mounted in a projection exposure apparatus (101) for EUV microlithography and comprises at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) which may be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) for cleaning the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (p0) for performing an exposure operation with the projection exposure apparatus (101). The result is an optical assembly capable of providing optical elements having an optical surface which may be impinged upon by a useful beam bundle which can be cleaned reliably from foreign particles.

Abstract translation: 光学组件用于安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63 ），所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面可被所述真空室（70,71,68a）的有用光束束（3）撞击 投影曝光装置（101）和用于清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（p0） 投影曝光装置（101）。 其结果是能够提供光学元件的光学组件，该光学元件具有光学表面，该光学表面可以被可以被外界颗粒可靠地清洁的有用束束撞击。

公开(公告)号：SG149783A1

公开(公告)日：2009-02-27

申请号：SG2008054611

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

Abstract: Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]

公开(公告)号：SG148971A1

公开(公告)日：2009-01-29

申请号：SG2008048233

申请日：2008-06-25

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

Abstract: Substrates and Methods of Using Those Substrates A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.