公开(公告)号：WO2014072149A2

公开(公告)日：2014-05-15

申请号：PCT/EP2013071141

申请日：2013-10-10

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  BANINE VADIM ,  NIKIPELOV ANDREY ,  OSORIO OLIVEROS EDGAR ,  STRUYCKEN ALEXANDER ,  VAN DRIEËNHUIZEN BERT ,  VAN SCHOOT JAN

IPC: G03F7/20 ,  H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target at a plasma formation location and directing a continuous-wave excitation beam at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置处提供连续更新的燃料目标并且在等离子体形成位置处引导连续波激发光束，使得连续更新的燃料靶内的燃料被连续波激发光束激发以产生辐射产生 等离子体。