公开(公告)号：JP2013042157A

公开(公告)日：2013-02-28

申请号：JP2012220645

申请日：2012-10-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES MARIA ,  WAKKER REMKO

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a substrate clamp system and a lithographic device capable of avoiding stress guided by particles and/or heat in a substrate and improving pattern transfer accuracy.SOLUTION: A lithographic device configured so as to transfer a pattern from a patterning device to a substrate W includes: a substrate table configured so as to hold the substrate; a first clamp system 40, 128 configured so as to clamp the substrate table to a substrate table support structure; and a second clamp system 40, 129 configured so as to clamp the substrate to the substrate table after the substrate table is clamped to the substrate table support structure.

Abstract translation: 要解决的问题：提供一种能够避免由基板中的颗粒和/或热引起的应力的基板夹紧系统和光刻装置，并提高图案转印精度。 解决方案：构造成将图案从图案形成装置传送到基板W的光刻装置包括：被配置为保持基板的基板台; 被配置为将衬底台夹持到衬底台支撑结构的第一夹紧系统40,128; 以及第二夹紧系统40,129，其被配置为在将基板台夹紧到基板台支撑结构之后将基板夹紧到基板台。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2007311787A

公开(公告)日：2007-11-29

申请号：JP2007123107

申请日：2007-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES M ,  WAKKER REMKO

IPC: H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can avoid stress guided by particles and heat in a substrate and can improve precision of pattern transcription. SOLUTION: This lithographic apparatus comprises a support structure MT connected with a primary positioner PM, which is configured to support a lighting system (illuminator) IL configured to adjust radiation beam B and a patterning device MA, and also to correctly position the patterning device according to a specific parameter; a substrate table WT that can connect with a secondary positioner PW, which is configured to correctly position the substrate W according to a specific parameter; and a projection system PS that is configured to project a pattern given to the radiation beam B by the patterning device MA to the target portion C of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以避免由基质引起的颗粒和热引起的应力的光刻设备，并且可以提高图案转录的精度。 解决方案：该光刻设备包括与初级定位器PM连接的支撑结构MT，其构造成支撑被配置为调节辐射束B的照明系统（照明器）IL和图案形成装置MA，并且还正确地定位 图案形成装置根据具体参数; 能够与辅助定位器PW连接的基板台WT，其被构造成根据特定参数正确定位基板W. 以及投影系统PS，其被配置为将由图案形成装置MA向辐射束B施加的图案投影到基板W的目标部分C.版权所有（C）2008，JPO＆INPIT

公开(公告)号：NL2003339A

公开(公告)日：2010-03-15

申请号：NL2003339

申请日：2009-08-10

Applicant: ASML NETHERLANDS BV

Inventor： VOZNYI OLEG ,  ONVLEE JOHANNES ,  BERGE PETER TEN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2008250A

公开(公告)日：2012-09-11

申请号：NL2008250

申请日：2012-02-07

Applicant: ASML NETHERLANDS BV

Inventor： NIENHUYS HAN-KWANG ,  CUIJPERS MARTINUS ,  LEVASIER LEON ,  SCHOOT JAN ,  VIJVER YURI ,  VOZNYI OLEG ,  JANSSEN FRANCISCUS ,  PHILIPS DANNY ,  MIRANDA MARCIO ,  GALAKTIONOV OLEKSIY ,  BAL KURSAT ,  SCHMITZ ROGER ,  LEROUX ALAIN ,  RANJAN MANISH ,  RIJPMA ALBERT

IPC: G03F7/20