公开(公告)号：JP2004343069A

公开(公告)日：2004-12-02

申请号：JP2004067549

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN GROOS PIETER JOHANNES MARI

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To minimize the contamination and defects due to the maintenance by making the time shortest for the maintenance of a machine part arranged in an internal space of the machine.
SOLUTION: This invention relates to a method of maintaining the machine part arranged in an internal space 11 of a machine 1. The internal space 11 is kept at a first pressure (P
vac ) and is separated from an environment having a second pressure (P
env ) via a load lock (LL). The method comprises transporting a machine part (32, WT) via the load lock (LL) out of the internal space 11, and transporting one of the maintained machine part and a separate replacement machine part via the load lock (LL) into the internal space 11.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：通过将排列在机器的内部空间中的机器部件的维护保持最短的时间来最小化由于维护而引起的污染和缺陷。 本发明涉及一种将机器部件保持在机器1的内部空间11中的方法。内部空间11保持在第一压力（P vac ），并且是 通过加载锁（LL）从具有第二压力的环境（P env ）分离。 该方法包括经由加载锁（LL）将机器部件（32，WT）运送出内部空间11，并将维护的机器部件和单独的更换机部件经由加载锁（LL）运输到内部 空间11.版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2007088465A

公开(公告)日：2007-04-05

申请号：JP2006252549

申请日：2006-09-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUINSMA ANASTASIUS JACOBUS AN ,  VAN GROOS PIETER JOHANNES MARI ,  HOOGKAMP JAN FREDERIK ,  MODDEMEIJER KEES ,  DRAAISMA FOLKERT

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01N21/956 ,  G03F7/70791 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a particle inspection system and a particle inspection method for inspecting particles present on the top surface of a substrate. SOLUTION: A photolithography apparatus transfers a pattern from a patterning device to a substrate, and includes the particle inspection system for inspecting the particles present on the top surface of the substrate. The particle inspection system incorporates a radiation source for the radiation generation, illumination optical system guiding the radiation generated by the radiation source to a detection area at the top surface of the substrate, detection optical system receiving the radiation from the inspection area at the top surface of the substrate, and a detector coupled to the inspection optical system for generating at least one measurement signal. This apparatus further incorporates a processing unit to determine the height of a particle based on at least one measurement signal and generate a height excess signal if the height exceeds a threshold value. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于检查存在于基板的顶表面上的颗粒的颗粒检查系统和颗粒检查方法。 解决方案：光刻装置将图案从图案形成装置传送到基板，并且包括用于检查存在于基板顶表面上的颗粒的颗粒检查系统。 颗粒检查系统包括用于辐射生成的辐射源，将由辐射源产生的辐射引导到基板顶表面处的检测区域的照明光学系统，接收来自顶表面上的检查区域的辐射的检测光学系统 以及耦合到检查光学系统的检测器，用于产生至少一个测量信号。 该装置还包括处理单元，用于基于至少一个测量信号确定颗粒的高度，并且如果高度超过阈值则产生高度过剩信号。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004343063A

公开(公告)日：2004-12-02

申请号：JP2004066539

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN GROOS PIETER JOHANNES MARI ,  MARIA HENNUS PIETER RENAAT ,  HOOGKAMP JAN FREDERIK ,  HENDRIK KLOMP ALBERT JAN ,  ONVLEE JOHANNES ,  VISSER RAIMOND

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

CPC classification number: H01L21/67225 ,  G03F7/70733 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70991 ,  H01L21/67201

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection assembly comprising: a substrate handler provided with a handler chamber in which at least two load locks for transferring a substrate between a first environment and a second environment are provided, the second environment has a lower pressure than the first environment, and further the second environment is superior; and a lithographic projection apparatus comprising a projection chamber. SOLUTION: The handler chamber and the projection chamber connect with each other through, on one hand, a loading position so that the substrate enters from the handler chamber the projection chamber, and on the other hand, an unloading position for taking out the substrate from the projection chamber to the handler chamber. The handler chamber is provided with a pretreatment means for pretreating the substrate, and a transporting means having a constitution in which the substrate is transferred from the load lock to the pretreatment means, and transferred from the pretreatment means to the loading position, and further transferred from the unloading position to the load lock. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG115632A1

公开(公告)日：2005-10-28

申请号：SG200401160

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HENNUS PIETER RENAAT MARIA ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  ONVLEE JOHANNES ,  VISSER RAIMOND

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677

Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.

公开(公告)号：SG115629A1

公开(公告)日：2005-10-28

申请号：SG200401151

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MART ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.