公开(公告)号：JP2007300142A

公开(公告)日：2007-11-15

申请号：JP2007207924

申请日：2007-08-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS J L M ,  KUIPERS LEO W M ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/139

Abstract: PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有温度调节的负载锁定，配备有负载锁定的光刻系统以及使用该装载锁制造衬底的方法。 解决方案：一个对象，例如 衬底W被转移到/从光刻系统中。 负载锁外壁38和40限定了装载锁定体积的至少一部分，用于容纳在物体W处于装载锁定状态时支撑物体W的支撑单元33和141。 此外，负载锁具有用于温度调节的结构，以至少在从负载锁转移到光刻系统之前控制物体的温度。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343065A

公开(公告)日：2004-12-02

申请号：JP2004067361

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS J L M ,  KUIPERS LEO W M ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/139

Abstract: PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2005051202A

公开(公告)日：2005-02-24

申请号：JP2004147188

申请日：2004-05-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: G03F1/08 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027

CPC classification number: G03F7/70933 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70808 ,  H01L21/67017 ,  H01L21/67201

Abstract: PROBLEM TO BE SOLVED: To prevent a substrate from fouling by suppressing entry of unnecessary particles or molecules at the time of opening and closing a door in a substrate loading device (LL) of an exposure system in which the pressure is lower than an atmospheric pressure. SOLUTION: The loading device (LL) forms a space, or a chamber, and comprises a first door (11) that faces a lithographic pattern forming chamber (PC), a second door (12) that faces a second environment, and a gas entrance (13). The gas entrance (13) is connected to a gas supply (17) so as to provide a gas at least for a portion of a period during which an object moves. This gas is a gas which basically does not include at least one of particles, oxygen, a hydrocarbon and H 2 O. Supplying a gas that does not foul a substrate allows the pressure in the loading device to be higher than an atmospheric pressure, thereby suppressing the entry of unnecessary particles or molecules at the time opening and closing the door between different atmospheres and thus preventing the substrate from fouling. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了防止基板在压力低于其的曝光系统的基板装载装置（LL）中打开和关闭门时抑制不必要的颗粒或分子进入而造成污染 大气压力。 解决方案：加载装置（LL）形成空间或室，并且包括面向光刻图案形成室（PC）的第一门（11），面向第二环境的第二门（12） 和气体入口（13）。 气体入口（13）连接到气体供应源（17），以至少在物体移动期间的一部分期间提供气体。 该气体是基本上不包括颗粒，氧气，烃和H 2 SB 2 O 2中的至少一种的气体。 提供不污染基板的气体允许加载装置中的压力高于大气压，从而在不同气氛之间打开和关闭门时抑制不必要的颗粒或分子的进入，从而防止基板 污垢。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343068A

公开(公告)日：2004-12-02

申请号：JP2004067524

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To increase the throughput of a lithography projection assembly. SOLUTION: The lithography projection assembly comprises at least one load-lock for transferring an article, especially a substrate, between a first environment and a second environment preferably having a pressure lower than that in the first environment, an article handler including a handler chamber which can be reached by the second environment, and a lithography projector including a projection chamber. The handler chamber and the projection chamber can be interconnected in order to transfer an article. The load-lock comprises a load-lock chamber, a means for exhausting the load-lock chamber, and a door means for closing the load-lock chamber during exhaust operation and opening the load-lock chamber in order to feed the article into the load-lock chamber or taking out the article therefrom. The load-lock chamber is provided with at least two positions for supporting different articles. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG115632A1

公开(公告)日：2005-10-28

申请号：SG200401160

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HENNUS PIETER RENAAT MARIA ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  ONVLEE JOHANNES ,  VISSER RAIMOND

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677

Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.

公开(公告)号：SG115630A1

公开(公告)日：2005-10-28

申请号：SG200401152

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS JOHANNES LOU ,  KUIPERS LEO WILHELMUS MARIA ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/027

Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.

公开(公告)号：SG115629A1

公开(公告)日：2005-10-28

申请号：SG200401151

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MART ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

公开(公告)号：SG115631A1

公开(公告)日：2005-10-28

申请号：SG200401159

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027

Abstract: A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.

公开(公告)号：SG141228A1

公开(公告)日：2008-04-28

申请号：SG2004026134

申请日：2004-05-14

Applicant: ASML NETHERLANDS BV

Inventor： HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: G03F7/20 ,  H01L21/00 ,  G03F1/08 ,  H01L21/027

Abstract: Lithographic Apparatus and Device Manufacturing Method The present invention relates to a method for transferring an object (W) via a load lock (LL) between a lithography patterning chamber (PC) and a second environment. The load lock (LL) forming an inner space that is enclosed by a wall forming said inner space and the load lock (LL) comprising a first door (11) facing the lithography patterning chamber and a second door (12) facing the second environment. The load lock (LL) is at least during part of the transfer vented with a gas that is essentially free from at least one of particles, oxygen, hydrocarbon and H[err]O.