公开(公告)号：WO2013127608A3

公开(公告)日：2013-10-24

申请号：PCT/EP2013052306

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  VAN HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/00

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/2002

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract translation: 一种形成图案化的化学外延模板的方法，用于在基材的表面上包含第一和第二聚合物嵌段的自组装嵌段共聚物的取向，该方法包括将底漆组合物的底漆层施加到表面，引物 组合物，其包含与第一聚合物嵌段具有化学亲合力的第一聚合物部分和与第二聚合物嵌段具有化学亲合力的第二聚合物部分，选择性地将表面，底漆层和任何上覆层暴露于光化辐射以提供曝光和未曝光 使得暴露区域中的第一聚合物部分不稳定，以及从暴露区域除去不稳定的第一聚合物部分，以消除第一聚合物部分的暴露区域中的底漆层表面，以形成图案化的化学外延模板。

公开(公告)号：NL2010254A

公开(公告)日：2013-09-09

申请号：NL2010254

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/20

公开(公告)号：NL2007108A

公开(公告)日：2012-02-06

申请号：NL2007108

申请日：2011-07-14

Applicant: ASML NETHERLANDS BV

Inventor： KOOLE ROELOF ,  BANINE VADIM ,  SCACCABAROZZI LUIGI ,  YILDIRIM OKTAY

IPC: G03F7/20

Abstract: An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.