公开(公告)号：US20210391139A1

公开(公告)日：2021-12-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Peter-Paul CRANS ,  Marc SMITS ,  Laura DEL TIN ,  Christan TEUNISSEN ,  Yang-Shan HUANG ,  Stijn Wilem, Herman, Karel STEENBRINK ,  Xuerang HU ,  Qingpo XI ,  Xinan LUO ,  Xuedong LIU

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/18 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20240006147A1

公开(公告)日：2024-01-04

申请号：US18369619

申请日：2023-09-18

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Christan TEUNISSEN ,  Paul Hendricus SCHEEPERS ,  Joseph Reinier MEIJER

IPC: H01J37/12 ,  H01J37/02 ,  H01J37/09

CPC classification number: H01J37/12 ,  H01J37/026 ,  H01J2237/0206 ,  H01J2237/0475 ,  H01J37/09

Abstract: Disclosed herein is a flood column for projecting a charged particle flooding beam along a beam path towards a sample to flood the sample with charged particles prior to assessment of the flooded sample using an assessment column, the flood column comprising: an anchor body arranged along the beam path; a lens arrangement arranged in a down-beam part of the flood column; and a lens support arranged between the anchor body and the lens arrangement; wherein the lens support is configured to position the lens arrangement and the anchor body relative to each other; the lens support comprises an electrical insulator; and the lens support is in the direct line of sight of at least a portion of the beam path in the down-beam part.

公开(公告)号：US20250095950A1

公开(公告)日：2025-03-20

申请号：US18967282

申请日：2024-12-03

Applicant: ASML Netherlands B.V.

Inventor： Paul IJmert SCHEFFERS ,  Christiaan OTTEN ,  Boris DAAN ,  Christan TEUNISSEN ,  Frank Theo OVERES

IPC: H01J37/09

Abstract: A charged particle-optical device for projecting a plurality of charged particle beams along respective beam paths towards a sample location, the charged particle-optical device comprising: a charged particle-optical assembly configured to manipulate the charged particle beams, the charged particle-optical assembly comprising a first charged particle-optical element comprising a plate having one or more apertures around a beam path of the charged particle beams; and an electrical connector configured to electrically connect the plate of the first charged particle-optical element to an electrical power source, wherein the electrical connector: comprises a shield configured to define a field free region substantially free of electric fields; and is configured to be electrically connectable to a flexible coupling configured to electrically connect the plate of the first charged particle-optical element to the electrical power source, the flexible coupling located within the field free region.

公开(公告)号：US20230020745A1

公开(公告)日：2023-01-19

申请号：US17952115

申请日：2022-09-23

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Johannes Cornelis Jacobus DE LANGEN ,  Aaron Yang-Fay AYAL ,  Michiel Matthieu BRUININK ,  Christiaan Ruben VAN DEN BERG ,  Christiaan OTTEN ,  Laura DINU GURTLER ,  Marc SMITS

IPC: H01J37/317 ,  G03F9/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/153 ,  H01J37/09

Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

公开(公告)号：US20230005699A1

公开(公告)日：2023-01-05

申请号：US17941897

申请日：2022-09-09

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Christian TEUNISSEN ,  Boudewjin Weijert Herman Jan VAN DER KROON ,  Jurgen VAN SOEST

IPC: H01J37/09 ,  H01J37/04

Abstract: Disclosed herein is an aperture body for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an up-beam facing surface; a chamber portion comprising an up-beam end, a down-beam end and an up-beam plate, wherein the up-beam plate extends radially inwards from the up-beam end and the up-beam plate is configured to define an entrance opening around the beam path; wherein: the up-beam facing surface extends radially inwards from the down-beam end; the up-beam facing surface comprises an aperture portion that is configured to define an opening around the beam path; and the opening defined by the aperture portion is smaller than the entrance opening.