公开(公告)号：EP1801068A3

公开(公告)日：2009-11-04

申请号：EP06126836.3

申请日：2006-12-21

Applicant: FEI COMPANY

Inventor： Schwind, Gregory ,  Magera, Gerald ,  Scipioni, Lawrence

IPC: B82B3/00

CPC classification number: H01J37/06 ,  B82Y15/00 ,  B82Y30/00 ,  H01J1/304 ,  H01J9/025 ,  H01J37/073 ,  H01J2201/30469 ,  H01J2209/0223 ,  H01J2237/06341 ,  Y10S438/962 ,  Y10S977/742 ,  Y10S977/745 ,  Y10S977/748 ,  Y10S977/75 ,  Y10S977/752 ,  Y10S977/773 ,  Y10S977/856 ,  Y10S977/857

Abstract: A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic "modules" which can be easily manipulated and shaped to fit standard mounts in various devices.

公开(公告)号：EP1501115A3

公开(公告)日：2007-09-05

申请号：EP04076891.3

申请日：2004-07-01

Applicant: FEI COMPANY

Inventor： Hill, Ray ,  Sanford, Colin ,  DiManna, Mark ,  Tanguay, Michael ,  Scipioni, Lawrence

IPC: H01J37/30 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

公开(公告)号：EP1801068B1

公开(公告)日：2012-09-26

申请号：EP06126836.3

申请日：2006-12-21

Applicant: FEI COMPANY

Inventor： Schwind, Gregory ,  Magera, Gerald ,  Scipioni, Lawrence

IPC: B82B3/00

CPC classification number: H01J37/06 ,  B82Y15/00 ,  B82Y30/00 ,  H01J1/304 ,  H01J9/025 ,  H01J37/073 ,  H01J2201/30469 ,  H01J2209/0223 ,  H01J2237/06341 ,  Y10S438/962 ,  Y10S977/742 ,  Y10S977/745 ,  Y10S977/748 ,  Y10S977/75 ,  Y10S977/752 ,  Y10S977/773 ,  Y10S977/856 ,  Y10S977/857

公开(公告)号：EP1501115B1

公开(公告)日：2009-07-01

申请号：EP04076891.3

申请日：2004-07-01

Applicant: FEI COMPANY

Inventor： Hill, Ray ,  Sanford, Colin ,  DiManna, Mark ,  Tanguay, Michael ,  Scipioni, Lawrence

IPC: H01J37/30 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

公开(公告)号：EP1801068A2

公开(公告)日：2007-06-27

申请号：EP06126836.3

申请日：2006-12-21

Applicant: FEI COMPANY

Inventor： Schwind, Gregory ,  Magera, Gerald ,  Scipioni, Lawrence

IPC: B82B3/00

CPC classification number: H01J37/06 ,  B82Y15/00 ,  B82Y30/00 ,  H01J1/304 ,  H01J9/025 ,  H01J37/073 ,  H01J2201/30469 ,  H01J2209/0223 ,  H01J2237/06341 ,  Y10S438/962 ,  Y10S977/742 ,  Y10S977/745 ,  Y10S977/748 ,  Y10S977/75 ,  Y10S977/752 ,  Y10S977/773 ,  Y10S977/856 ,  Y10S977/857

Abstract: A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic "modules" which can be easily manipulated and shaped to fit standard mounts in various devices.

Abstract translation: 使用已建立的光刻技术的批量制造方法，其允许以适合于大规模批量生产的可重复且可靠的方式将纳米颗粒或纳米装置制造和安装在宏观装置中。 纳米颗粒可以在宏观“模块”上生长，其可以容易地操作和成形，以将标准安装件装配在各种装置中。

公开(公告)号：EP1501115A2

公开(公告)日：2005-01-26

申请号：EP04076891.3

申请日：2004-07-01

Applicant: FEI Company

Inventor： Hill, Ray ,  Sanford, Colin ,  DiManna, Mark ,  Tanguay, Michael ,  Scipioni, Lawrence

IPC: H01J37/30 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得在离子束操作期间物镜不被关闭。 可选的二次粒子检测器和可选的电荷中和喷枪适于在存在磁场的情况下操作。 磁物镜被设计成具有恒定的热标记，而不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。