公开(公告)号：KR20200128088A

公开(公告)日：2020-11-11

申请号：KR20207027901

申请日：2019-04-12

Applicant: FUJIFILM CORP

Inventor： OISHI YASUFUMI ,  TAKAHASHI HIDENORI

IPC: G03F7/004 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26

Abstract: 라인위드스러프니스성능과노광래티튜드성능을, 온도가변화할수 있는환경하에서경시보존한경우에있어서도유지가능한레지스트조성물, 및이것을이용한레지스트막, 패턴형성방법, 및전자디바이스의제조방법을제공한다. 산의작용에의하여분해되어극성기를발생하는기를갖는반복단위와, 락톤구조, 설톤구조, 설폰일구조, 및카보네이트구조중 적어도어느하나를갖는반복단위를포함하는수지, 및활성광선또는방사선의조사에의하여산을발생하는화합물을포함하는레지스트조성물로서, 상기수지의분산도가 1.7 이하이며, Na, K, Ca, Fe, Cu, Mg, Mn, Al, Li, Cr, Ni, Sn, Pb, Zn, Co, Ti, Ag, W, V, Ba, Au, As, Cd, Zr 및 Mo의각 금속원소의함유량의총합인금속원소함유량이, 상기레지스트조성물의전체질량에대하여, 0.01질량ppt 이상 1질량ppb 이하이다.

公开(公告)号：EP3009479A4

公开(公告)日：2016-07-27

申请号：EP14810700

申请日：2014-06-09

Applicant: FUJIFILM CORP

Inventor： ARAYAMA KYOHEI ,  MURAYAMA SATORU ,  TAKAHASHI HIDENORI

IPC: C08L101/00 ,  C08K5/00 ,  C09D5/32 ,  C09D7/12 ,  C09D201/00 ,  G02B5/22 ,  H01L27/14

CPC classification number: G02B5/208 ,  C08K5/0041 ,  C08K5/3415 ,  C09D5/32 ,  C09D7/40 ,  G02B1/10 ,  G02B5/223 ,  G03F7/0007 ,  H01L27/14618 ,  H01L31/02162 ,  H01L31/02325

Abstract: Provided are a curable composition which can be used to produce a cured film that does not easily allow a near infrared-absorbing pigment to be eluted even when the cured film is immersed in a solvent, a cured film, a near infrared cut filter, a camera module, and a method for manufacturing a camera module. The curable composition including: a near infrared-absorbing pigment (A) and a curable compound (B) having one or more atoms or groups selected from a fluorine atom, a silicon atom, a linear alkyl group having 8 or more carbon atoms, and a branched alkyl group having 3 or more carbon atoms.

公开(公告)号：EP2715451A4

公开(公告)日：2015-03-04

申请号：EP12793094

申请日：2012-05-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  SHIRAKAWA MICHIHIRO ,  TAKAHASHI HIDENORI ,  SAITOH SHOICHI ,  YOSHINO FUMIHIRO

IPC: G03F7/039 ,  C08F220/12 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0382 ,  C08F220/12 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/325

公开(公告)号：EP2478414A4

公开(公告)日：2013-07-03

申请号：EP10817323

申请日：2010-09-16

Applicant: FUJIFILM CORP

Inventor： FUJII KANA ,  TSUCHIMURA TOMOTAKA ,  FUJIMORI TORU ,  TAKAHASHI HIDENORI ,  ITO TAKAYUKI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/12

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.

公开(公告)号：EP2399168A4

公开(公告)日：2013-06-05

申请号：EP10792234

申请日：2010-06-23

Applicant: FUJIFILM CORP

Inventor： FUJIMORI TORU ,  SHIRAKAWA KOJI ,  USA TOSHIHIRO ,  SUGIYAMA KENJI ,  ITO TAKAYUKI ,  TSUBAKI HIDEAKI ,  NISHIMAKI KATSUHIRO ,  HIRANO SHUJI ,  TAKAHASHI HIDENORI

IPC: G03F7/039 ,  B29C33/38 ,  B29C59/02 ,  C08F12/00 ,  C08F20/00 ,  C08F20/50 ,  G03F7/00 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F20/50 ,  B29C33/38 ,  B29C2033/426 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

公开(公告)号：EP2324392A4

公开(公告)日：2012-11-14

申请号：EP09811498

申请日：2009-08-26

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  TSUCHIMURA TOMOTAKA ,  TSUCHIHASHI TORU ,  YAMASHITA KATSUHIRO ,  NISHIKAWA NAOYUKI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  C08F222/40 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F12/32 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F222/36 ,  C08F212/32 ,  C08F2220/1883

公开(公告)号：EP2478415A4

公开(公告)日：2015-02-25

申请号：EP10817324

申请日：2010-09-16

Applicant: FUJIFILM CORP

Inventor： IIZUKA YUSUKE ,  TAKAHASHI HIDENORI ,  SHIRAKAWA MICHIHIRO ,  YOSHIDOME MASAHIRO ,  HIRANO SHUJI

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F220/26 ,  G03F7/0397 ,  G03F7/2041

公开(公告)号：EP2681623A4

公开(公告)日：2015-05-06

申请号：EP12752967

申请日：2012-02-24

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITOH SHOICHI

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

公开(公告)号：EP2577397A4

公开(公告)日：2014-03-05

申请号：EP11786732

申请日：2011-05-20

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  TAKAHASHI HIDENORI ,  HIRANO SHUJI ,  KAMIMURA SOU ,  KATO KEITA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40 ,  Y10T428/24

公开(公告)号：SG10201710324WA

公开(公告)日：2018-02-27

申请号：SG10201710324W

申请日：2014-06-09

Applicant: FUJIFILM CORP

Inventor： ARAYAMA KYOHEI ,  MURAYAMA SATORU ,  TAKAHASHI HIDENORI

Abstract: Provided are a curable composition which can be used to produce a cured film that does not easily allow a near infrared-absorbing pigment to be eluted even when the cured film is immersed in a solvent, a cured film, a near infrared cut filter, a camera module, and a method for manufacturing a camera module. The curable composition including: a near infrared-absorbing pigment (A) and a curable compound (B) having one or more atoms or groups selected from a fluorine atom, a silicon atom, a linear alkyl group having 8 or more carbon atoms, and a branched alkyl group having 3 or more carbon atoms.