1.
    发明专利
    未知

    公开(公告)号:DE69616645T2

    公开(公告)日:2002-08-01

    申请号:DE69616645

    申请日:1996-04-22

    Applicant: IBM

    Abstract: A head (10) is provided for reading and writing to tape media (48) along a tape head face. The tape head comprises a plurality of modules, each module comprising a read element (54) and a write element (52) spaced apart and terminating at the tape head face and formed over a substrate (12). The read element comprises a soft film bias layer (24) and a hard film bias layer (25) butted against the SFB layer. The write element comprises two pole tips (14,16) spaced apart by a gap (22). The tape head further includes a plurality of activating conducting coil turns (20) operatively associated with the write element and covered by a cross-linked photoresist and positioned between the gap and one of the pole tips and set back from the tape head face. The tape head has at least one of the following elements: (a) a wear shield (34) between the read element and the write element for limiting wear of the gap between the two pole tips, the wear shield being grounded for decoupling read and write functions of the tape head, for allowing same module read/servo/write functions simultaneously, and for grounding static charge from the tape media; (b) a layer of electrically conductive and corrosion-resistant material (62), such as rhodium, under the hard film bias layer to reduce its resistance; and (c) a non-activating dummy coil turn (120,220) closer to the pole tips than the activating coil turns for defining a forward termination of the cross-linked photoresist (38a) between the activating coil turns and the tape head face to thereby provide improved ease of processability.

    Magnetic head and method for making such a head

    公开(公告)号:HK210996A

    公开(公告)日:1996-12-06

    申请号:HK210996

    申请日:1996-11-28

    Applicant: IBM

    Abstract: An interleaved bi-directional magnetic tape head for contact recording has a stripe poletip 30 in the form of a thin film of a soft magnetic material deposited onto a magnetic ferrite substrate 22. A second thin film polepiece 40 is deposited over a gap region 26. A closure block 24 of a non-magnetic ceramic encloses the layers together with leveling insulation layers 32, 34 and deposited activating conductor turns 36. The stripe poletip extends for a distance just short of the first conductor turn and provides a balancing of the saturation moment of the pole pieces and provides for better recording capability, especially when operating in a trailing magnetic ferrite mode.

    A MAGNETIC RECORDING MEDIUM
    3.
    发明专利

    公开(公告)号:DE3267119D1

    公开(公告)日:1985-12-05

    申请号:DE3267119

    申请日:1982-05-14

    Applicant: IBM

    Abstract: This invention relates to a magnetic recording medium comprising a sputtered polycrystalline film of material having the formula CoxPty where x (Co) is up to 90 atomic percent of said material and y (Pt) is from 10 to 30 atomic of said material. The film has a magnetostriction value of from -35 x 10 to a value near substantially zero magnetostriction in the range of +/- 10 x 10 . The material has a coercivity Hc of from 500 to 2000 oersteds with a saturation magnetization of 400 gauss to 15,000 gauss.

    SEMI-CONDUCTOR DEVICE BY OXIDATION OF POROUS SILICON

    公开(公告)号:AU498236B2

    公开(公告)日:1979-02-22

    申请号:AU2029176

    申请日:1976-12-06

    Applicant: IBM

    Abstract: A semiconductor device, such as a transistor, integrated circuit or the like, having a pattern of oxidized and densified porous silicon regions extending onto one of its major surfaces for isolating regions of the semiconductor is manufacturable by a relatively simple process. The process involves forming porous silicon regions in the surface of the semiconductor body such as a silicon wafer, in the areas where dielectric isolation between semiconductor devices is desired. The porous silicon regions are then oxidized at a temperature sufficient to completely oxidize the porous silicon. The oxidiation is such that the oxidized porous silicon extends above the surface of the semiconductor wafer. The oxidized porous silicon regions are then subjected to a temperature higher than the oxidizing temperature utilized in the previous step to cause the densification of the oxidized porous silicon regions. The result of this densification step is the collapse of the porous oxide to a dense structure which is substantially planar with the surface of the semiconductor wafer. This densified silicon dioxide structure has an etch rate which is substantially the same as thermally grown silicon dioxide.

    5.
    发明专利
    未知

    公开(公告)号:DE69213558D1

    公开(公告)日:1996-10-17

    申请号:DE69213558

    申请日:1992-04-30

    Applicant: IBM

    Abstract: An interleaved bi-directional magnetic tape head for contact recording has a stripe poletip 30 in the form of a thin film of a soft magnetic material deposited onto a magnetic ferrite substrate 22. A second thin film polepiece 40 is deposited over a gap region 26. A closure block 24 of a non-magnetic ceramic encloses the layers together with leveling insulation layers 32, 34 and deposited activating conductor turns 36. The stripe poletip extends for a distance just short of the first conductor turn and provides a balancing of the saturation moment of the pole pieces and provides for better recording capability, especially when operating in a trailing magnetic ferrite mode.

    7.
    发明专利
    未知

    公开(公告)号:CH597691A5

    公开(公告)日:1978-04-14

    申请号:CH1320176

    申请日:1976-10-19

    Applicant: IBM

    Abstract: A semiconductor device, such as a transistor, integrated circuit or the like, having a pattern of oxidized and densified porous silicon regions extending onto one of its major surfaces for isolating regions of the semiconductor is manufacturable by a relatively simple process. The process involves forming porous silicon regions in the surface of the semiconductor body such as a silicon wafer, in the areas where dielectric isolation between semiconductor devices is desired. The porous silicon regions are then oxidized at a temperature sufficient to completely oxidize the porous silicon. The oxidiation is such that the oxidized porous silicon extends above the surface of the semiconductor wafer. The oxidized porous silicon regions are then subjected to a temperature higher than the oxidizing temperature utilized in the previous step to cause the densification of the oxidized porous silicon regions. The result of this densification step is the collapse of the porous oxide to a dense structure which is substantially planar with the surface of the semiconductor wafer. This densified silicon dioxide structure has an etch rate which is substantially the same as thermally grown silicon dioxide.

    MAGNETIC HEAD WITH ENHANCED POLETIP AND METHOD FOR MAKING

    公开(公告)号:CA2064641C

    公开(公告)日:1998-09-22

    申请号:CA2064641

    申请日:1992-04-01

    Applicant: IBM

    Abstract: An interleaved bi-directional magnetic tape head for contact recording can have a poletip enhanced by providing a thin film of a soft magnetic material deposited onto a magnetic ferrite substrate. The second pole piece is a thin film of the soft magnetic material. A closure block of a non-magnetic ceramic encloses the layers together with leveling insulation layers and a deposited activating conductor turns. The stripe poletip deposited onto the magnetic ferrite extends for a distance just short of the first conductor turn and provides a balancing of the saturation moment of the pole pieces and provides for better recording capability, especially when operating in a trailing magnetic ferrite mode.

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