Low-temperature methods for spontaneous material spalling

    公开(公告)号:GB2503851A

    公开(公告)日:2014-01-08

    申请号:GB201318741

    申请日:2012-05-08

    Applicant: IBM

    Abstract: Method to (i) introduce additional control into a material spalling process, thus improving both the crack initiation and propagation, and (ii) increase the range of selectable spalling depths are provided. In one embodiment, the method includes providing a stressor layer on a surface of a base substrate at a first temperature which is room temperature. Next, the base substrate including the stressor layer is brought to a second temperature which is less than room temperature. The base substrate is spalled at the second temperature to form a spalled material layer. Thereafter, the spalled material layer is returned to room temperature, i.e., the first temperature.

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