High brightness ion source
    1.
    发明授权
    High brightness ion source 失效
    高亮度离子源

    公开(公告)号:US3914655A

    公开(公告)日:1975-10-21

    申请号:US37445773

    申请日:1973-06-28

    Applicant: IBM

    CPC classification number: H05H3/02 H01J27/24

    Abstract: A high brightness ion beam is obtainable by using lasers to excite atoms or molecules from the ground state to an ionized state in increments, rather than in one step. The spectroscopic resonances of the atom or molecule are used so that relatively long wavelength, low power lasers can be used to obtain such ion beam.

    Abstract translation: 通过使用激光器将原子或分子以增量的方式而不是在一个步骤中从基态激发到电离状态,可以获得高亮度离子束。 使用原子或分子的光谱共振,使得可以使用相对较长波长的低功率激光器来获得这样的离子束。

    COLD ELECTRON EMISSION DEVICE
    3.
    发明专利

    公开(公告)号:DE3167275D1

    公开(公告)日:1985-01-03

    申请号:DE3167275

    申请日:1981-04-10

    Applicant: IBM

    Abstract: A high brightness, essentially monoenergetic electron source is constructed in solid state material by providing a semiconductor body with an electron confinement barrier over most of the surface, the barrier having a relatively small opening exposing the semiconductor body, in the relatively small opening a material is placed in contact with the semiconductor body that has a work function that is lower than the energy of excited electrons in the semiconductor. In this structure electrons from hole-electron pairs generated in the semiconductor are repelled and recombination is inhibited by the barrier except in the relatively small opening where they are injected into the surrounding environment through the lower work function material. The hole-electron pair generation may be by irradiation or by electrical injection. The electron source is useful for such applications as high brightness sources, digital communications, cathode ray tube electron sources and scanning electron microscopes.

    NONCONTACT DYNAMIC TESTER FOR INTEGRATED CIRCUITS

    公开(公告)号:DE3573320D1

    公开(公告)日:1989-11-02

    申请号:DE3573320

    申请日:1985-10-04

    Applicant: IBM

    Abstract: Testing of integrated circuit process intermediates, such as wafers, dice or chips in various stages of production (test chip) is facilitated by a nonintrusive, noncontact dynamic testing technique, using a pulsed laser 7, with laser light modification 8 to increase photon energy through conversion to shorter wavelength. The high energy laser light excites electron emissions to pass to the detection system 13, 14 as a composite function of applied light energy and of dynamic operation of the circuit; detecting those emissions by an adjacent detector requires no ohmic contacts or special circuitry on the integrated circuit chip or wafer. Photoelectron energy 10 emitted from a test pad 3 on the test chip 1 is detected as a composite function of the instantaneous input voltage as processed on the test chip, in dynamic operation including improper operation due to fault. The pulse from the 'laser, as modified through light modification, the parameters of detection of bias voltages, and the distances involved in chip-grid-detector juxtaposition, provides emissions for detection of circuit voltages occuring on the test chip under dynamic conditions simulating actual or stressed operation, with high time resolution of the voltages and their changes on the circuit.

    10.
    发明专利
    未知

    公开(公告)号:DE2425184A1

    公开(公告)日:1975-01-16

    申请号:DE2425184

    申请日:1974-05-24

    Applicant: IBM

    Abstract: A high brightness ion beam is obtainable by using lasers to excite atoms or molecules from the ground state to an ionized state in increments, rather than in one step. The spectroscopic resonances of the atom or molecule are used so that relatively long wavelength, low power lasers can be used to obtain such ion beam.

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